1999
DOI: 10.1063/1.123160
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Low dielectric constant Parylene-F-like films for intermetal dielectric applications

Abstract: Cataloged from PDF version of article.We report on the dielectric properties and thermal stability of thin polymer films that art: suitable candidates for replacing silicon dioxide as the intermetal dielectric material in integrated circuits. Parylene-F-Iike films, (-CF2-C6H4-CF2-)(n), were produced by plasma deposition from a mixture of Ar and 1,4-bis(trifluoromethyl)benzene (CF3-C6H4-CF3) discharges and characterized using infrared absorption spectroscopy, spectroscopic ellipsometry, and capacitance measurem… Show more

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Cited by 13 publications
(7 citation statements)
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“…The electrons of amorphous parylene AF8 membranes have enough activity to absorb gases that increase the total van der Waals and electrostatic terms. The corresponding F–F atomic distances are less in amorphous AF8 membranes . As seen in Fig.…”
Section: Resultsmentioning
confidence: 75%
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“…The electrons of amorphous parylene AF8 membranes have enough activity to absorb gases that increase the total van der Waals and electrostatic terms. The corresponding F–F atomic distances are less in amorphous AF8 membranes . As seen in Fig.…”
Section: Resultsmentioning
confidence: 75%
“…The corresponding F-F atomic distances are less in amorphous AF8 membranes. [2] As seen in Fig. 8, gases exist and move near the polymers molecules in the free volumes of parylene AF8 membranes.…”
Section: Resultsmentioning
confidence: 90%
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“…For the polymerization of p-xylylene, with its commercial name parylene, which is widely used as a coating material for medical purposes [10,11], but also for isolating purposes with a pinhole-free film that is impermeable to water vapor and other gases, even at very low thicknesses [12,13], several reactions have to be investigated: "conventional" chemical vapor deposition happens by expanding at least one reactive gas in a vacuum reactor, which is either subjected to thermolysis or to a second gas, resulting in a chemical reaction. In contrast to these processes, parylene is mostly deposited by the Gorham process, which requires evaporation of a precursor, and temperatures between 130 and 150…”
Section: Introductionmentioning
confidence: 99%