“…5a are in agreement with several previous reports on the sensitivity of the LO phonon mode at defects [40,41], at residual stresses induced in the thin film/substrate interface [40,41], and at the surface states of thin films (roughness, grain characteristics and surface defects) [42,40,43]. The irregularity observed at In = 2% could be attributed to the experimental conditions of deposition in ambient atmosphere, which were difficult to respect for all samples, and to the SiO 2 substrate surface state (roughness, corrugation), which might have varied from sample to sample [34,44,45].…”