We performed spin transport measurements on boron nitride based single layer graphene devices with mobilities up to 40 000 cm 2 V −1 s −1 . We could observe spin transport over lengths up to 20 µm at room temperature, the largest distance measured so far for graphene. Due to enhanced charge carrier diffusion, spin relaxation lengths are measured up to 4.5 µm. The relaxation times are similar to values for lower quality SiO2 based devices, around 200 ps. We find that the relaxation rate is determined in almost equal measures by the Elliott-Yafet and D'Yakonov-Perel mechanisms.The potential of graphene [1] as an emerging material for spintronics has been established, revealing spin relaxation lengths λ of 2 µm at room temperature [2]. Spins relax over a length λ = √ D s τ s , where D s is the spin diffusion constant and τ s the spin relaxation time. One straightforward way to achieve spin transport over larger distances is to enhance D s by fabricating high mobility devices. On the other hand, τ s is theoretically predicted to range up to hundreds of nanoseconds [3]. However, observations made in the recent years by experimentalists [2, 4-13] do not match up to the high expectations set by theory. Measurements typically indicate τ s to be in the hundred picoseconds range and the discrepancy between theory and experiment and the exact relaxation mechanism remain yet unclear. Some works suggest that spin relaxation is dominated by the Elliott-Yafet (EY) mechanism [4,11,14], where τ s is proportional to the momentum relaxation time τ p and spins lose their information during scattering events. Other efforts indicate that the D'Yakonov-Perel (DP) mechanism is stronger [3,15,16], where τ s is inversely proportional to τ p and spins dephase in between scattering events.In identifying the limiting factors on spin transport in graphene, the substrate deserves special attention. For charge transport it has already been shown that the standard silicon oxide substrate reduces the mobility of charge carriers considerably [17]. The SiO 2 substrate is expected to also affect the spin relaxation in graphene through its roughness, trapped charges and surface phonons [16]. One approach to reduce the substrate roughness and screen impurities is to use epitaxial graphene on silicon carbide [12,18]. However, the presence of localized states is believed to affect spin transport in this system [13]. Alternatively, eliminating the influence of the substrate by suspending the graphene flake yields a 3 orders of magnitude increase in mobility [19,20]. Suspended spintronic graphene devices have been studied and a lower bound for τ s of ∼200 ps was found [10]. Determination of the actual value was however not possible since the presence of local supports for the suspended device was found to dominate the extraction of τ s .Atomically flat hexagonal boron nitride (h-BN) was found to be a much better substrate than SiO 2 for high quality graphene electronics [21][22][23], yielding a 2 orders of magnitude increase in mobility. In this manuscri...