Extended x-ray absorption fine structure (EXAFS) investigation was carried out on two arsenic-doped HgCdTe samples. Arsenic incorporation was achieved with a non-conventional radiofrequency plasma source in a molecular beam epitaxy reactor. Both samples were taken from the same epitaxial run. One of these samples followed a 400°C activation anneal under Hg pressure. EXAFS was used here to probe the local environment around arsenic, and the experimental data were fit through first-principle calculations to extract a quantitative description of the arsenic site transfer upon annealing. Arsenic neighbors are described in terms of chemical nature, numbers and distances. Arsenic was found to be involved mostly in noncrystalline structures, either an As 2 Te 3 glass or an AsHg compact structure. The effect of annealing is to break down the chalcogenide glass, thus favoring the compact AsHg structure. EXAFS results were compared to 77 K Halleffect measurements, and a very good correlation was found. These findings were compared to the commonly admitted scenario for arsenic site incorporation and transfer upon annealing and provided a new picture and the first experimental evidence of the site transfer.