1997
DOI: 10.1063/1.120420
|View full text |Cite
|
Sign up to set email alerts
|

Local stress measurements in laterally oxidized GaAs/AlxGa1−xAs heterostructures by micro-Raman spectroscopy

Abstract: Lattice deformation induced in surface GaAs layers by the selective lateral oxidation of buried AlxGa1−xAs layers was determined from the energy shift of the GaAs phonon line in Raman spectra excited with a focused laser beam. The procedure included a correction for the laser beam induced heating effects. The surface GaAs layer was found under small tensile stress in the oxidized regions of our samples with respect to the unoxidized regions. The deformation is 8×10−4 and is the same, within experimental error,… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

0
12
0

Year Published

1999
1999
2018
2018

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 26 publications
(12 citation statements)
references
References 17 publications
0
12
0
Order By: Relevance
“…Two groups have used micro-Raman spectroscopy to estimate the strain in GaAs cap layers. 12,13 In the investigation of Landesman et al, micro-Raman spectroscopy was used to measure the deformation of a 1000 Å GaAs cap due to the oxidation of a 1000 Å AlAs layer lying directly beneath the cap. The strain induced in the cap layer was determined to be 0.08%.…”
Section: Discussionmentioning
confidence: 99%
“…Two groups have used micro-Raman spectroscopy to estimate the strain in GaAs cap layers. 12,13 In the investigation of Landesman et al, micro-Raman spectroscopy was used to measure the deformation of a 1000 Å GaAs cap due to the oxidation of a 1000 Å AlAs layer lying directly beneath the cap. The strain induced in the cap layer was determined to be 0.08%.…”
Section: Discussionmentioning
confidence: 99%
“…In general, the GaAs LO phonon is observed at a lower wave number in the light regions, as compared to its position in the dark regions. Because of unequal heating in oxidized and unoxidized samples, 11 we cannot make a direct comparison of phonon positions in our samples before and after oxidation. However, we can obtain an estimate of the strain induced in the samples by the oxidation process by assuming an unstrained GaAs LO phonon position of 291.8 cm Ϫ1 .…”
Section: Discussionmentioning
confidence: 99%
“…[8][9][10] As demonstrated by Landesman et al, the oxidation process induces local strain in the GaAs cap layer at the oxide-AlAs interface. 11 Because of the reduced oxidation rate in the ͓011͔ direction, the volume contraction of the oxide will not be symmetric with respect to the center of the mesa. This effect should be greatest as the oxidation nears completion and may explain the drumhead patterns observed in mesas, which are almost completely oxidized.…”
Section: Discussionmentioning
confidence: 99%
See 2 more Smart Citations