“…A thickness-graded LiF layer, with the thickness increasing from zero to about 10 nm over several millimeters, was then evaporated on top of the Au NPs at normal incidence. WS 2 flakes were grown on SiO 2 /Si via liquid-precursor CVD (LqP-CVD) in a twozone horizontal furnace (Lenton), following a procedure already detailed in previous studies [49][50][51]. Briefly, an aqueous solution containing a tungsten precursor (ammonium metatungstate hydrate, AMT, Sigma-Aldrich Inc, St. Luis, MO, USA, 463922) was mixed with an aqueous solution with the growth promoter (NaOH) and iodixanol, used as a density gradient (Sigma-Aldrich Inc., Opti Prep, D1556) and deionized water, in a ratio 1.5:2:1:2.…”