Lithography Masks and Pattern Transfer

Romeo, C.; Cantù, Pietro

doi:10.1016/b0-12-369401-9/00505-2

Cited by 3 publications

(2 citation statements)

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“…Following this spin coating process, the substrate undergoes a heating process, referred to as soft baking, which partially evaporates the solvent and stabilizes the photoresist. Subsequently, the sample is exposed to UV light of a wavelength ranging from 150 to 450 nm (depending on the photoresist) using a mask featuring the desired pattern, leading to the selective patterning of the photoresist ( Romeo and Cantù, 2005 ). When the sample is exposed to UV light, the exposed photoresist either becomes soluble or insoluble in photoresist developer due to a radiation-induced solubility change.…”

Section: Manufacturing Methodsmentioning

confidence: 99%

3D and 4D assembly of functional structures using shape-morphing materials for biological applications

Mirzababaei,

Towery,

Kozminsky

2024

Front. Bioeng. Biotechnol.

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3D structures are crucial to biological function in the human body, driving interest in their in vitro fabrication. Advances in shape-morphing materials allow the assembly of 3D functional materials with the ability to modulate the architecture, flexibility, functionality, and other properties of the final product that suit the desired application. The principles of these techniques correspond to the principles of origami and kirigami, which enable the transformation of planar materials into 3D structures by folding, cutting, and twisting the 2D structure. In these approaches, materials responding to a certain stimulus will be used to manufacture a preliminary structure. Upon applying the stimuli, the architecture changes, which could be considered the fourth dimension in the manufacturing process. Here, we briefly summarize manufacturing techniques, such as lithography and 3D printing, that can be used in fabricating complex structures based on the aforementioned principles. We then discuss the common architectures that have been developed using these methods, which include but are not limited to gripping, rolling, and folding structures. Then, we describe the biomedical applications of these structures, such as sensors, scaffolds, and minimally invasive medical devices. Finally, we discuss challenges and future directions in using shape-morphing materials to develop biomimetic and bioinspired designs.

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Section: Manufacturing Methodsmentioning

confidence: 99%

3D and 4D assembly of functional structures using shape-morphing materials for biological applications

Mirzababaei,

Towery,

Kozminsky

2024

Front. Bioeng. Biotechnol.

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“…Many scholars have explored phase differences in various aspects. For instance, the principle of phase difference mask resulted in destructive interference and attained better image contrast [5]. In another study, a minor phase difference was measured in a fibre interferometer for pressure sensing [6].…”

Section: Introductionmentioning

confidence: 99%

A New Predictive Hypothesis for Phase Difference Reflection in GHz

Elmutasim,

Mohd,

Karim

2023

Ecas 2023

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Refurbishment of W/B₄C multilayers on Si substrate by etching a chromium buffer layer

Hou

Cui

et al. 2022

Opt. Express

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In synchrotron facilities, optics with multilayer coatings are used for beam monochromatization, focusing, and collimation. These coatings might be damaged by high heat load, poor film adhesion, high internal stress, or poor vacuum. Optical substrates always need high quality, which is expensive and has a long processing cycle. Therefore, it is desired to make the substrate reusable and the refurbished coating as good as a brand-new one. In this study, a W/B4C multilayer coating with a 2 nm Cr buffer layer was prepared on a Si substrate. The coating was successfully stripped from the Si substrate by dissolving the Cr buffer layer using an etchant. The roughness and morphology after the different etching times were investigated by measuring the GIXRR and 3D surface profiler. It is shown that the time required to etch the W/B4C multilayer coating with a Cr buffer layer, is quite different compared with etching a single Cr film. A layer of silicon dioxide was introduced during the fitting. After the new etching process, the roughness of the sample is as good as the one on a brand-new substrate. The W/B4C multilayer coatings with a Cr buffer layer were recoated on the etched samples, and the interface roughness was not damaged by the etching process.

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Lithography Masks and Pattern Transfer

Cited by 3 publications

References 0 publications

3D and 4D assembly of functional structures using shape-morphing materials for biological applications

3D and 4D assembly of functional structures using shape-morphing materials for biological applications

A New Predictive Hypothesis for Phase Difference Reflection in GHz

Refurbishment of W/B₄C multilayers on Si substrate by etching a chromium buffer layer

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Lithography Masks and Pattern Transfer

Cited by 3 publications

References 0 publications

3D and 4D assembly of functional structures using shape-morphing materials for biological applications

3D and 4D assembly of functional structures using shape-morphing materials for biological applications

A New Predictive Hypothesis for Phase Difference Reflection in GHz

Refurbishment of W/B4C multilayers on Si substrate by etching a chromium buffer layer

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Product

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Refurbishment of W/B₄C multilayers on Si substrate by etching a chromium buffer layer