2007
DOI: 10.1016/j.snb.2006.11.005
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Lithographic nano-patterning of colloidal nanocrystal emitters for the fabrication of waveguide photonic devices

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Cited by 14 publications
(7 citation statements)
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“…In previous works [18,27], we already verified the effectiveness and the outlook of this localization approach. The systematic analysis reported here allows to extend this technique to any kind of colloidal nanocrystals (provided that they are soluble in resist blends) with a broad range of concentrations.…”
Section: Introductionsupporting
confidence: 68%
“…In previous works [18,27], we already verified the effectiveness and the outlook of this localization approach. The systematic analysis reported here allows to extend this technique to any kind of colloidal nanocrystals (provided that they are soluble in resist blends) with a broad range of concentrations.…”
Section: Introductionsupporting
confidence: 68%
“…In particular, the incorporation of such NCs in PMMA increases the refractive index of the polymer from 1.49 up to 1.62. The nanocomposite has been used to fabricate a ridge cavity confined by two active blend/air distributed Bragg Reflectors (DBRs) with an e-beam energy of 20 keV and a distributed feedback (DBF) structure formed of periodic corrugations on top of waveguides by a beam energy of 1 keV [ 153 ]. Highly ordered triangular-shaped gold nanopatterns 200 nm in size on PMMA resist modified with CdSe@ZnS NCs and CdSe nanorods, respectively have been fabricated.…”
Section: Patterning Towards Devices: Conventional and Unconventionmentioning
confidence: 99%
“…In particular, control of self-assembly of functional materials based on dewetting is immensely important for realizing the possibility of adapting processing technologies to fabricate desired patterns over large areas [15][16][17][18][19]. Owing to impressive progress in materials science, a broad range of strategies used to pattern nanoparticles have been designed given rise to a variety of top-down methods such as advanced photolithographic techniques (EBL) [20,21] (soft embossing, decal transfer microlithography (DTM) [22], imprinting [23], soft lithography [24], micro-contact and microtransfer printing [22][23][24][25]. However, elastomeric stamps can contaminate solutions with unreacted oligomers [26] and swell upon contact with nonpolar solvents (e.g., hydrocarbons, toluene, and dichloromethane) [27].…”
Section: Introductionmentioning
confidence: 99%