2009
DOI: 10.1016/j.mee.2008.11.073
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Multicolored devices fabricated by direct lithography of colloidal nanocrystals

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Cited by 14 publications
(9 citation statements)
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“…Because of that, shell energy landscape strongly influences the electrons wavefunction ( Ψ e ) while preserving holes confinement. Colloidal CdSe/CdS DRs have already been demonstrated to show remarkable single‐photon polarization properties,38, 39 high room‐temperature PL quantum efficiency15, 40 and interesting compatibility with planar nanofabrication technologies 41–45. The DRs investigated in this work have been produced by a wet‐chemical seeded‐growth approach,15 a synthetic procedure that allows a precise control of the heterostructure geometrical parameters 16, 46.…”
mentioning
confidence: 99%
“…Because of that, shell energy landscape strongly influences the electrons wavefunction ( Ψ e ) while preserving holes confinement. Colloidal CdSe/CdS DRs have already been demonstrated to show remarkable single‐photon polarization properties,38, 39 high room‐temperature PL quantum efficiency15, 40 and interesting compatibility with planar nanofabrication technologies 41–45. The DRs investigated in this work have been produced by a wet‐chemical seeded‐growth approach,15 a synthetic procedure that allows a precise control of the heterostructure geometrical parameters 16, 46.…”
mentioning
confidence: 99%
“…Nano- and micro-sized multicolour pixels characterized by a high colour definition and high emission tuneability have been fabricated by applying UVL and EBL on nanocomposites formed of red and green CdSe@ZnS NCs incorporated in SU-8 and PMMA, respectively by using chlorobenzene as common solvent. The combination of both the lithography techniques in subsequent re-alignments steps, the control of both the NC concentration and geometry of patterns localized in contiguous regions have allowed for achieving a finely tuning of the pixel emission [ 155 ].…”
Section: Patterning Towards Devices: Conventional and Unconventionmentioning
confidence: 99%
“…54 by dispersing a specific concentration of nano− crystals inside a negative high−resolution electron−beam re− sist after precipitation and re−dilution in methyl−isobutyl− ketone (MIBK) solvent. Ensembles of nanocrystals embed− ded in electronic resists can be easily patterned by means of traditional lithographic processes, since the presence of semiconductor clusters in the matrix does not significantly affect the sensitivity of the polymeric host and, at the same time, the emission properties of the nanocrystals are not in− fluenced by the interaction with the electron beam [55]. To obtain on average one nanocrystal inside a nanosized pillar of the NC/resist blend, direct e−beam patterning is employed [Figs.…”
Section: Localization Of Single Quantum Dotsmentioning
confidence: 99%