2023
DOI: 10.1364/ol.499084
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Light-triggered 2D electron gas in a GaN-based HEMT with sandwiched p-GaN layers

Abstract: In this work, a p-n junction-coupled metal-insulator-semiconductor (MIS) normally-off high-electron-mobility transistor (HEMT) UVPD is proposed. A two-dimensional electron gas (2DEG) at the AlN/U-GaN interface is entirely depleted with a dark current of 1.97 × 10−11 A because of the design of the sandwiched p-GaN layers. Under 365 nm illumination, the 2DEG is light triggered at Vds = 1 V with a high light on/off ratio of over 107 at a light power density of 286.39 mW·cm−2. Meanwhile, it exhibits fast rise and … Show more

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Cited by 3 publications
(5 citation statements)
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“…R is calculated by the formula of R = I photo I dark A , I photo and I dark represent the photocurrent and dark current under the same bias condition, and A represent the area of gate region. The responsivity linearly increases as the light intensity decreases in double logarithmic coordinates, following a relationship of the form R ∝ P β–1 , where β is 0.35 and mainly related to the process including generation, recombination and trapping of the carriers. , For the as-fabricated AlGaN/GaN double-channel HEMT PD, the highest responsivity at 9.7 μW/cm 2 was remarkable as 2.1 × 10 7 A/W, which was much higher than that of previously reported GaN HEMT PDs, as shown in Table . This behavior was further evaluated by the term external quantum efficiency (EQE), which can be calculate by EQE = h c R λ q , where h , c , q , and λ are Planck’s constant, velocity of light, elementary electric charge, and light wavelength, respectively .…”
Section: Resultsmentioning
confidence: 83%
“…R is calculated by the formula of R = I photo I dark A , I photo and I dark represent the photocurrent and dark current under the same bias condition, and A represent the area of gate region. The responsivity linearly increases as the light intensity decreases in double logarithmic coordinates, following a relationship of the form R ∝ P β–1 , where β is 0.35 and mainly related to the process including generation, recombination and trapping of the carriers. , For the as-fabricated AlGaN/GaN double-channel HEMT PD, the highest responsivity at 9.7 μW/cm 2 was remarkable as 2.1 × 10 7 A/W, which was much higher than that of previously reported GaN HEMT PDs, as shown in Table . This behavior was further evaluated by the term external quantum efficiency (EQE), which can be calculate by EQE = h c R λ q , where h , c , q , and λ are Planck’s constant, velocity of light, elementary electric charge, and light wavelength, respectively .…”
Section: Resultsmentioning
confidence: 83%
“…Moreover, a significant number of electrons accumulated within the quantum wells, increasing the light-induced electron concentration. As a result, our designed GaN HEMT PD enables high R and excellent photosensitivity under UV illumination …”
Section: Resultsmentioning
confidence: 95%
“…As a result, our designed GaN HEMT PD enables high R and excellent photosensitivity under UV illumination. 30 Most importantly, according to the I ds −V ds curves, PDCR is a function of P at V ds = 5 V, and various light power intensities under 365 nm illumination are described in Figure 6a. PDCR monotonously increases from 1.3 × 10 7 to 7 × 10 8 at V ds = 5 V when P is ranging from 0.235 to 286.39 mW/cm 2 .…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…17 However, the latter structure displays a slower response time than that of the p-GaN gate. In addition, GaN photodetectors with other structures, such as MOSFET-type, 18 GaN HEMT-type with sandwiched p-GaN layers, 19 and double channels, 20 have also achieved good photodetection performance. In this study, we demonstrate UVPD arrays based on recessed-gated HEMTs with a p-GaN buried layer under a 2DEG channel.…”
Section: ■ Introductionmentioning
confidence: 99%