Light-induced damage to DNA origami nanostructures in the 193 nm–310 nm range

Abstract

DNA origami nanostructures provide precisely addressable substrates for in
singulo experiments as well as for applications in nanotechnology. We report on experiments
evaluating the stability of DNA origami upon irradiation with light at different wavelengths
and buffer solutions. DNA is irradiated with nanosecond pulsed lasers and the damage is
evaluated using UV-Vis spectroscopy and atomic force microscopy imaging. We show that
the wavelength dependence of the damage follows the UV absorption spectrum of DNA.
Electronic excitation of DNA is primarily responsible for DNA origami damage at present
wavelengths. We also demonstrate UV-Vis absorption of tris reaction products, influencing
the UV-Vis absorption evaluation in experiments studying DNA damage.

Interaction of low-energy electrons with radiosensitizers

“…However, the experiments must be perfromed with care about the the LEE-induced chemistry of buffer components to avoid misinterpretations. 101,265,266…”