2017
DOI: 10.1088/1361-6641/aa60b8
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Light-emitting silicon nanowires obtained by metal-assisted chemical etching

Abstract: This review reports on a new process for the synthesis of Si nanowires (NWs), based on the wet etching of Si substrates assisted by a thin metal film. The approach exploits the thicknessdependent morphology of the metal layers to define uncovered nanometric Si regions, which behave as precursor sites for the formation of very dense (up to 1×10 12 NW cm −2 ) arrays of long (up to several μm) and ultrathin (diameter of 5-9 nm) NWs. Intense photoluminescence (PL) peaks, characterized by maxima in the 640-750 nm… Show more

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Cited by 41 publications
(40 citation statements)
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“…[ 32,33,35,36 ] Note that in this case, the observed distortions in Raman spectra correspond to theoretical considerations that phonon confinement reveals itself in the structures with a diameter less that 10–20 nm. [ 23–29,31–34 ] We do not observe any maximum red shift within the chosen spectral resolution or a broader half‐width at the lower wavenumber side of the Raman spectra of as‐prepared and thermally annealed SiNWs (Figure 2a) as could be expected for small‐diameter nanowires. [ 31 ] We also have a good fit by the Fano‐resonance model (Equation ) as shown in Figure 3 and Figure 5.…”
Section: Resultsmentioning
confidence: 54%
See 1 more Smart Citation
“…[ 32,33,35,36 ] Note that in this case, the observed distortions in Raman spectra correspond to theoretical considerations that phonon confinement reveals itself in the structures with a diameter less that 10–20 nm. [ 23–29,31–34 ] We do not observe any maximum red shift within the chosen spectral resolution or a broader half‐width at the lower wavenumber side of the Raman spectra of as‐prepared and thermally annealed SiNWs (Figure 2a) as could be expected for small‐diameter nanowires. [ 31 ] We also have a good fit by the Fano‐resonance model (Equation ) as shown in Figure 3 and Figure 5.…”
Section: Resultsmentioning
confidence: 54%
“…Because the Raman line shape can be modified by phonon confinement, [ 22–36 ] one should be scrupulous about the possible impact of phonon confinement to the estimations of the FCC concentration in SiNWs. MACE formation of SiNW arrays on highly boron‐doped c‐Si substrates leads to the narrowing of nanowire diameter and additional nanowire porosity that results in a distortion of the lower wavenumber side of Fano‐resonance line.…”
Section: Resultsmentioning
confidence: 99%
“…For both samples, any residual metal impurities are expected to remain close to the tips of the nanowires, therefore, affecting less than 0.2% of the DBs that we probe experimentally. The metal contamination in SiNWs produced by MACE, in contrast with those produced by the vaporliquid-solid method with a metal catalyst, has been found negligible by different experimental methods [21][22][23][24]. The full process led to a dense carpet of straight silicon nanowires, fully passivated with H and with structural parameters dependent on the process details ( Fig.…”
Section: Methodsmentioning
confidence: 96%
“…Among them, the chemical etching approach proved to be a more rapid and practical technique for producing uniform SiNWs at room temperature with inexpensive and scalable procedures [15,16,17]. …”
Section: Introductionmentioning
confidence: 99%