2013
DOI: 10.1007/s00339-013-8101-9
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Light absorption in Ge nanoclusters embedded in SiO2: comparison between magnetron sputtering and sol–gel synthesis

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Cited by 4 publications
(7 citation statements)
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“…The mean diameter of the Ge nanocrystals increases usually with the temperature and duration of the annealing process. This is observed for all deposition techniques like MS, ion‐implantation, and CVD . In addition, the crystallization process starts at lower temperatures for longer annealing times …”
Section: Synthesis Of Ge Nanocrystals Via Phase Separation From Supermentioning
confidence: 66%
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“…The mean diameter of the Ge nanocrystals increases usually with the temperature and duration of the annealing process. This is observed for all deposition techniques like MS, ion‐implantation, and CVD . In addition, the crystallization process starts at lower temperatures for longer annealing times …”
Section: Synthesis Of Ge Nanocrystals Via Phase Separation From Supermentioning
confidence: 66%
“…At this temperature, however, crystalline and amorphous portions can be found . Only after annealing at 800 °C, the Ge is fully crystalline . The crystallization temperature of the SiO 2 is much higher than the one of Ge.…”
Section: Influence Of Different Matrix Materialsmentioning
confidence: 91%
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“…[26][27][28] Nevertheless, there are clear discrepancies in the theoretical modeling and experimental results concerning germanium NCs, and therefore, no well-established generally accepted relationship between germanium NC size and optical bandgap exists. [26][27][28][29][30] In particular Takeoka et al 23 reports that a PL energy of 1.25 eV corresponds to a relatively small NC diameter of ,2 nm, whereas Niquet et al 28 reports the formation of much larger germanium NCs with diameters of ,8 nm upon annealing at the same temperature. However, it is unclear whether the amount of excess germanium and/or sputtering conditions were similar in these two studies.…”
Section: Resultsmentioning
confidence: 99%
“…Details on the SiGeO deposition, Ge diffusion, QD growth and structural order of Ge QDs are given in ref. 4,25,33. The presence and the size distribution of Ge QDs were evaluated by cross sectional transmission electron microscopy in scanning mode (STEM) analysis.…”
Section: Methodsmentioning
confidence: 99%