2010
DOI: 10.1016/j.jclepro.2009.10.004
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Life cycle assessment of DRAM in Taiwan's semiconductor industry

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Cited by 39 publications
(12 citation statements)
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“…memory wafer having 1,100 gross Si die, i.e. 0.13 kg/Si die (Liu et al 2010). Boyd et al reported 6 kg CO 2 e/Si die for a 300-mm 0.775-mm-thick 45-nm node CMOS wafer with 590 gross silicon die (Boyd et al 2009).…”
Section: Methodsmentioning
confidence: 99%
“…memory wafer having 1,100 gross Si die, i.e. 0.13 kg/Si die (Liu et al 2010). Boyd et al reported 6 kg CO 2 e/Si die for a 300-mm 0.775-mm-thick 45-nm node CMOS wafer with 590 gross silicon die (Boyd et al 2009).…”
Section: Methodsmentioning
confidence: 99%
“…Hansen, 1999) and sometimes uncritically. It is often recommended that if weighting is used, several weighting methods should be used in order to illustrate the difference between different methods The use of weighting in LCA can be illustrated by several recent papers in this journal where weighting have been used, often Ecoindicator (Mahgoub et al, 2010, Contreras et al, 2009, Kiwjaroun et al, 2009, Liu et al, 2010, Tsoutsos et al, 2010, Zackrisson, 2005 or the EPS method (Zackrisson, 2005), whereas one paper calls for MultiCriteria Decision Analysis tools (Gaudreault et al, 2009). The broad use of Ecoindicator is interesting since this method is now quite old and is not available in peer-reviewed publications.…”
Section: Classification a Qualitative Step Where The 'Interventions'mentioning
confidence: 99%
“…Boyd et al (2009Boyd et al ( , 2010) developed a life cycle energy analysis for complementary metal-oxidesemiconductor and digital logic chips over seven technology nodes to compare energy demand and GWP impacts of the life cycle stages, respectively. Liu et al (2010) selected two life cycle assessment (LCA) methods to evaluate the GWP from direct/indirect CO 2 emissions and energy consumption of production equipment, which are the major environmental impacts of dynamic random access memory products. Higgs et al (2010) focused on the energy and CO 2 impacts associated with the creation of high-puritygrade materials that are required for semiconductor manufacturing.…”
Section: Introductionmentioning
confidence: 99%