LEED investigations on the interaction of Pd and Ni with different Si(111) surfaces

Clabes, J. G.

doi:10.1016/0039-6028(84)90767-2

Cited by 45 publications

(10 citation statements)

References 48 publications

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“…3 High temperature reactions are utilized in a number of processing methods including contact reactions, mesotaxy, and allotaxy, to name a few. Several surface reconstructions have been reported for this system including 2ϫ2, 5 ͱ3ϫͱ3, 6 and ͱ19ϫͱ19. Several surface reconstructions have been reported for this system including 2ϫ2, 5 ͱ3ϫͱ3, 6 and ͱ19ϫͱ19.…”

Section: Introductionmentioning

confidence: 99%

Surface phase transformations in the Ni/Si(111) system observed in real time using low-energy electron microscopy

Bennett

Lee

Parikh

et al. 1995

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Epitaxial surface of NiSi2(001) studied with lowenergy electron diffraction and scanning tunneling microscopy Thinfilm crystallography using reflection highenergy electron diffraction ''rod intensity profiles'': Ni/Si(111) Submonolayer Ni deposits quenched from above 840°C produce an ''impurity stabilized'' 1ϫ1 phase, which scanning tunnel microscope observations reveal to be a 1ϫ1 lattice gas of ring clusters ͑RCs͒ together with Si adatoms in local 2ϫ2 domains. We call this phase 1ϫ1-RC. Real time low-energy electron microscopy observations show the following: terraces are covered with the 1ϫ1-RC phase except for narrow strips of 7ϫ7 along the top side of bilayer steps. The strip width decreases with increasing Ni coverage and increasing quench rate. Slow cooling results in clean 7ϫ7 only. Depositing Ni at 700°C causes the 1ϫ1-RC phase to expand, consuming 7ϫ7. At 720°C, the 1ϫ1-RC phase mixes with 7ϫ7 to cover the terraces uniformly. Depositing at 500°C instead causes formation of NiSi 2 islands in a matrix of clean 7ϫ7. These reactions are summarized in terms of a temperature versus coverage phase formation diagram.

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Section: Introductionmentioning

confidence: 99%

Surface phase transformations in the Ni/Si(111) system observed in real time using low-energy electron microscopy

Bennett

Lee

Parikh

et al. 1995

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…11 Thus, the ͱ3ϫͱ3 structure seems to appear when the deposited Ni coverage is rather small. In fact, from the STM images, the height of the island is determined to be 0.15 nm relative to the ͱ19ϫͱ19 surface.…”

Section: Resultsmentioning

confidence: 99%

Scanning tunneling microscopy study of the interfacial structure of nickel silicides

Yoshimura

Shinabe

Yao

1996

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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The growth of ultrathin silicide ͑ϳmonolayer͒ has been studied by scanning tunneling microscopy. Ni atoms react with the Si͑111͒-7ϫ7 surface to form clusters at room temperature. With increasing annealing temperature, they gradually coalesce and form monolayer islands surrounded by ͱ19ϫͱ19 ring structures. The surface structure shows ͱ3ϫͱ3-R30°at 400°C and 2ϫ2 at 600°C. The latter structure is a new finding for the Ni/Si system. It is suggested that the transformation of the surface structure on the monolayer island can be related to a change of the interfacial structure.

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“…14,16,17 Electron energy-loss spectroscopy was applied to analyse the composition of the superstructure phase. Figure 6 shows EELS spectra of the Si L 23 edge taken from positions A-C, indicated by double circles in Fig.…”

Section: Resultsmentioning

confidence: 99%

Analytical ultrahigh‐vacuum transmission electron microscopy applied to the study of Pd₂Si island formation on Si(111) surfaces

Takeguchi¹,

Tanaka²,

Yasuda³

et al. 2001

Surface & Interface Analysis

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Analytical ultrahigh-vacuum transmission electron microscopy was applied to study the formation process of Pd 2 Si islands on Si(111) surfaces. The deposition of Pd onto the Si(111) surfaces at ∼670 K caused the formation of Pd 2 Si islands of size 10-40 nm. High-resolution transmission electron microscopy (HRTEM) revealed an epitaxial interface, surface depression, bulk erosion of the substrate around the islands and a superstructure phase at the (0001) surface of the islands. Energy-dispersive x-ray spectroscopy (EDS) combined with HRTEM enabled us to identify the composition of the islands as Pd 2 Si. Electron energy-loss spectroscopy indicated that the superstructure phase of the island (0001) surface was induced by the surface segregation of Si atoms.

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LEED investigations on the interaction of Pd and Ni with different Si(111) surfaces

Cited by 45 publications

References 48 publications

Surface phase transformations in the Ni/Si(111) system observed in real time using low-energy electron microscopy

Surface phase transformations in the Ni/Si(111) system observed in real time using low-energy electron microscopy

Scanning tunneling microscopy study of the interfacial structure of nickel silicides

Analytical ultrahigh‐vacuum transmission electron microscopy applied to the study of Pd₂Si island formation on Si(111) surfaces

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LEED investigations on the interaction of Pd and Ni with different Si(111) surfaces

Cited by 45 publications

References 48 publications

Surface phase transformations in the Ni/Si(111) system observed in real time using low-energy electron microscopy

Surface phase transformations in the Ni/Si(111) system observed in real time using low-energy electron microscopy

Scanning tunneling microscopy study of the interfacial structure of nickel silicides

Analytical ultrahigh‐vacuum transmission electron microscopy applied to the study of Pd2Si island formation on Si(111) surfaces

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Analytical ultrahigh‐vacuum transmission electron microscopy applied to the study of Pd₂Si island formation on Si(111) surfaces