Analytical ultrahigh‐vacuum transmission electron microscopy applied to the study of Pd<sub>2</sub>Si island formation on Si(111) surfaces

Takeguchi, Masaki; Tanaka, Miyoko; Yasuda, Hidehiro; Furuya, Kazuo

doi:10.1002/sia.957

Cited by 14 publications

(3 citation statements)

References 14 publications

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“…The deposits were characterized with a 200 kV ultrahigh vacuum field emission gun transmission electron microscope (UHV-FEG-TEM), equipped with an electron energy loss spectroscopy (EELS) device [18]. A post-deposition heat treatment was carried out in a pre-treatment chamber connected to the specimen chamber of the UHV-FEG-TEM through a gate valve.…”

Section: Methodsmentioning

confidence: 99%

Fabrication of magnetic nanostructures using electron beam induced chemical vapour deposition

Takeguchi¹,

Shimojo²,

Furuya³

2005

Nanotechnology

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Finely focused electron beam induced chemical vapour deposition with iron carbonyl gas, Fe(CO)5, was carried out at room temperature to fabricate desired-shape nanostructures such as dots, rods and rings. The as-formed structures exhibited an amorphous phase containing iron, carbon and oxygen elements in the whole volume and iron oxide nanocrystals existed near their surfaces. A post-deposition heat treatment at about 600 °C resulted in the transformation into a crystalline alpha-iron phase, while their shapes were maintained. The residual magnetic flux density Br of the as-formed and alpha-iron nanorods was quantitatively measured by electron holography after magnetization, showing that their Br values were similar to those of iron micro-powders, although the alpha-iron nanorod has a smaller Br value than the as-formed nanorod.

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Section: Methodsmentioning

confidence: 99%

Fabrication of magnetic nanostructures using electron beam induced chemical vapour deposition

Takeguchi¹,

Shimojo²,

Furuya³

2005

Nanotechnology

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“…They are connected through the UHV transferal system. 35,36) The specimen can remain in the UHV environment during the process of Si substrate treatment and Fe deposition.…”

Section: Methodsmentioning

confidence: 99%

Characterization Investigation of β-FeSi₂Semiconductor by In Situ Ultrahigh-Vacuum Transmission Electron Microscopy

Zhang

Tanaka

Takeguchi

et al. 2003

Jpn. J. Appl. Phys.

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In an integrated ultrahigh-vacuum system, a thin Fe layer was deposited on a Si (111) 7 Â 7 surface at room temperature by ultrahigh-vacuum molecular beam epitaxy (UHV-MBE) and annealed at 600 C. The characterization of the as-deposited and annealed specimen for microstructure and electronic structure was investigated using an analytical ultrahigh-vacuum transmission electron microscope (UHV-TEM) and an electron energy-loss spectroscope (EELS). After deposition of a 5 ML Fe layer, an epitaxial Fe layer formed on the Si surface, which suggests that the Si substrate may induce the arrangement of Fe atoms in the thin Fe layer. When annealed at 600 C, epitaxial -FeSi 2 islands with moiré fringes formed on the Si substrate. The Fe 3d occupancy change for as-deposited Fe and -FeSi 2 was calculated by the empirical method after background subtraction by the power law and deconvolution by the Fourier ratio. The calculated results show that there is a 0:95 AE 0:06 electron/atom decrease for Fe 3d occupancy from as-deposited Fe to -FeSi 2 . Fe white lines intensity ratios for the two states were calculated from the second derivative spectra, which are 2.89 and 2.51 for as-deposited Fe and -FeSi 2 , respectively. The results for the intensity ratio show that the higher intensity ratio is related to stronger magnetism.

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“…The deposits were characterized with a 200 kV ultrahighvacuum field-emission-gun transmission electron microscope (UHV-FEG-TEM) equipped with an EELS device. 18) Postdeposition heat treatment was carried out in a pretreatment chamber connected to the specimen chamber of the UHV-FEG-TEM through a gate valve. The specimens were heated up to 600 C for 1-2 h. The vacuum pressure of the pretreatment chamber was maintained on the order of 10 À7 Pa during the heat treatment.…”

Section: Methodsmentioning

confidence: 99%

Fabrication of Alpha-Iron and Iron Carbide Nanostructures by Electron-Beam Induced Chemical Vapor Deposition and Postdeposition Heat Treatment

Takeguchi

Shimojo

Furuya

2005

Jpn. J. Appl. Phys.

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We succeeded in fabricating crystalline alpha-iron nanostructures with desired shapes. Electron-beam-induced chemical vapor deposition with iron carbonyl gas, Fe(CO)5, was carried out at room temperature in a field-emission-gun scanning electron microscope to fabricate nanodots, nanorods and square frames. The as-deposited structures exhibited an amorphous phase containing iron, carbon and oxygen in their entire volumes and iron oxide nanocrystals existed near their surfaces. Postdeposition heat treatment at about 600°C resulted in the formation of crystalline alpha-iron and iron carbide phases in their structures, while maintaining their shapes. Quantitative elemental analyses using electron energy loss spectroscopy suggested that the original as-deposited iron-to-carbon compositional ratio is crucial in determining the stoichiometry of the produced structures after the heat treatment.

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Analytical ultrahigh‐vacuum transmission electron microscopy applied to the study of Pd₂Si island formation on Si(111) surfaces

Cited by 14 publications

References 14 publications

Fabrication of magnetic nanostructures using electron beam induced chemical vapour deposition

Fabrication of magnetic nanostructures using electron beam induced chemical vapour deposition

Characterization Investigation of β-FeSi₂Semiconductor by In Situ Ultrahigh-Vacuum Transmission Electron Microscopy

Fabrication of Alpha-Iron and Iron Carbide Nanostructures by Electron-Beam Induced Chemical Vapor Deposition and Postdeposition Heat Treatment

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Analytical ultrahigh‐vacuum transmission electron microscopy applied to the study of Pd2Si island formation on Si(111) surfaces

Cited by 14 publications

References 14 publications

Fabrication of magnetic nanostructures using electron beam induced chemical vapour deposition

Fabrication of magnetic nanostructures using electron beam induced chemical vapour deposition

Characterization Investigation of β-FeSi2Semiconductor by In Situ Ultrahigh-Vacuum Transmission Electron Microscopy

Fabrication of Alpha-Iron and Iron Carbide Nanostructures by Electron-Beam Induced Chemical Vapor Deposition and Postdeposition Heat Treatment

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Analytical ultrahigh‐vacuum transmission electron microscopy applied to the study of Pd₂Si island formation on Si(111) surfaces

Characterization Investigation of β-FeSi₂Semiconductor by In Situ Ultrahigh-Vacuum Transmission Electron Microscopy