2007
DOI: 10.1063/1.2813021
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Lattice relaxation mechanism of ZnO thin films grown on c-Al2O3 substrates by plasma-assisted molecular-beam epitaxy

Abstract: We report on the lattice relaxation mechanism of ZnO films grown on c-Al2O3 substrates by plasma-assisted molecular-beam epitaxy. The lattice relaxation of ZnO films with various thicknesses up to 2000nm is investigated by using both in situ time-resolved reflection high energy electron diffraction observation during the initial growth and absolute lattice constant measurements (Bond method) for grown films. The residual strain in the films is explained in terms of lattice misfit relaxation (compression) at th… Show more

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Cited by 50 publications
(23 citation statements)
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“…Following these reports, several authors adopted this interpretation for different ZnO samples. 15,20,[34][35][36][37] However, a convergent picture concerning the defect identification and the electronic properties of the 3.333 eV line has not yet emerged as evidenced by the large variety of contradicting explanations for this emission in recent years. Even less is known about the often weaker lines between 3.33 and 3.35 eV which sporadically appear in combination with the Y 0 transition.…”
Section: Introductionmentioning
confidence: 95%
“…Following these reports, several authors adopted this interpretation for different ZnO samples. 15,20,[34][35][36][37] However, a convergent picture concerning the defect identification and the electronic properties of the 3.333 eV line has not yet emerged as evidenced by the large variety of contradicting explanations for this emission in recent years. Even less is known about the often weaker lines between 3.33 and 3.35 eV which sporadically appear in combination with the Y 0 transition.…”
Section: Introductionmentioning
confidence: 95%
“…22,23 The extracted values of ∆E strain at the DX state in Fig. 3(d) could be further compared with the analytical expression under the strained Hamiltonian by presuming that the underlying mechanism of the strain effect upon spectrally shifting the DX peak is similar to that for the F X peak, 32 as verified by near-field scanning optical microscopy measurements from strained ZnO NWs:…”
Section: Resultsmentioning
confidence: 99%
“…Considering the thinner buffer layer compared to the strain relaxation range over approximately 200 nm, 22,23 a depth-dependent strain variation and the subsequent carrier localization in traps along the growth axis are expected, followed by the QSE in the tapered region. In order to spatially trace the influences of these effects in ZnO NNs, the PL was measured along the growth axis as a function of the incident angle θ of a laser beam, which was varied from 0…”
Section: Methodsmentioning
confidence: 99%
“…Additionally, being nanoparticles grown in a wet-chemical process, their crystal structure is not affected by strain with a growth substrate. For films less than 200 nm compressive strain in the lattice can exist [20]. Hydrogen being able to be an interstitial or substitutional donor, crystal strain could play a role in the energetics of the hydrogen incorporation into the lattice.…”
Section: Discussionmentioning
confidence: 99%