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2016
DOI: 10.1021/acsnano.6b06496
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Laterally Stitched Heterostructures of Transition Metal Dichalcogenide: Chemical Vapor Deposition Growth on Lithographically Patterned Area

Abstract: Two-dimensional transition metal dichalcogenides (TMDCs) have shown great promise in electronics and optoelectronics due to their unique electrical and optical properties. Heterostructured TMDC layers such as the laterally stitched TMDCs offer the advantages of better electronic contact and easier band offset tuning. Here, we demonstrate a photoresist-free focused ion beam (FIB) method to pattern as-grown TMDC monolayers by chemical vapor deposition, where the exposed edges from FIB etching serve as the seeds … Show more

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Cited by 53 publications
(49 citation statements)
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References 44 publications
(71 reference statements)
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“…The vdW interactions between the adjacent layers at the interface are weak, while their electron orbitals extend to each other and affect the electronic band structures in each layer . The interlayer coupling between two vdW‐stacked 2D layers can be modulated from noninteraction to strong interaction, resulting in novel physical properties.…”
Section: Energy Band Alignments Of Vdwhsmentioning
confidence: 99%
“…The vdW interactions between the adjacent layers at the interface are weak, while their electron orbitals extend to each other and affect the electronic band structures in each layer . The interlayer coupling between two vdW‐stacked 2D layers can be modulated from noninteraction to strong interaction, resulting in novel physical properties.…”
Section: Energy Band Alignments Of Vdwhsmentioning
confidence: 99%
“…However, some transition metal hybrid interfaces were found with a transition width of several lattice constants . In the two‐step strategy (Figure (b)), one sort of TMD film is synthesized first and then patterned by focused ion beam or covered by WO 3− x layer for protection sometimes. Afterwards, heteroepitaxy of the second sort of TMD occurs along the exposed edge of the pre‐synthesized TMD film.…”
Section: Experimental Synthesis and Growth Controlmentioning
confidence: 99%
“…A similar strategy can also be coupled with lithographic processes to pattern these heterojunction flakes. For example, the initially grown TMDC monolayer can be patterned by lithography, such as ion beam etching, followed by the growth of a second TMDC monolayer to adjust the etched area seamlessly …”
Section: Heterostructure Light‐emitting Devicesmentioning
confidence: 99%