2007
DOI: 10.1063/1.2748303
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Lasing characteristics of ZnxMg1−xO and ZnO:Al epilayers

Abstract: Optical characteristics of ZnxMg1−xO, ZnO:Al, and ZnO epilayers are investigated. At pulse laser pumping, stimulated emissions are observed in these epilayers. Among them, spectral blueshifts are dependent on the Mg substitution concentration, and the highest lasing photon energy of 3.51eV ever reported is observed in ZnO series materials. Furthermore, experimental results also show that by high concentration Mg substitution, a redshift of the electron-hole plasma stimulated emission is reduced and its efficie… Show more

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Cited by 20 publications
(13 citation statements)
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“…Very recently, wide‐bandgap nanostructured ZnO with high exciton binding energy (∼60 meV) has attracted considerable attention as a promising candidate for solar cells, gas sensors, biosensors, nano‐lasers, and in electroluminescence and photoluminescence applications 1–5. Pure ZnO, however, cannot meet the increasing demand of the present applications.…”
Section: Introductionmentioning
confidence: 99%
“…Very recently, wide‐bandgap nanostructured ZnO with high exciton binding energy (∼60 meV) has attracted considerable attention as a promising candidate for solar cells, gas sensors, biosensors, nano‐lasers, and in electroluminescence and photoluminescence applications 1–5. Pure ZnO, however, cannot meet the increasing demand of the present applications.…”
Section: Introductionmentioning
confidence: 99%
“…Although sputtering methods and various methods of optimizing film growth have been reported to improve ZnO film quality, the quality of sputtered films is still too poor than other methods, such as pulsed laser deposition 8 and molecular beam epitaxy. 9 However, ZnO films can be produced by sputtering in high yield at low cost for the use as TCO films and in ZnO-based devices. 17,18 The RIE chamber was precleaned by an O 2 discharge process for 30 min to prevent contamination.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…[8][9][10][11] To fabricate such devices, ZnO films should be easily processed using standard device process. Currently, the inductively coupled plasma ͑ICP͒ etching system is used as a standard tool in the production and research of ZnO devices.…”
Section: Introductionmentioning
confidence: 99%
“…3(a) can be ascribed to the P 2 band due to X-X scattering. 24,26 By contrast, at t ¼ 3 ls and d ¼ 6 mm, the PL spectra in the inset of Fig. 3(a) are characterized by a single emission peak at 3.23 eV for all I exc due to excitonic recombination.…”
mentioning
confidence: 92%
“…At higher I exc below Mott transition, a PL emission band appears only in high quality samples due to inelastic collision between excitons, which results in an exciton to be excited into a higher state (n¼2,3,4, …,1), and a photon emitted with energy given by 24,26 (1)…”
mentioning
confidence: 99%