Laser-produced plasma EUV source based on tin-rich, thin-layer targets

Rakowski, Rafał; Mikołajczyk, J.; Bartnik, A.; Fiedorowicz, Henryk; Dortan, F. de Gaufridy de; Jarocki, R.; Kostecki, J.; Szczurek, M.; Wachulak, P.

doi:10.1007/s00340-010-4193-5

Cited by 12 publications

(6 citation statements)

References 53 publications

(50 reference statements)

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“…1 EUV radiation from a laser produced tin plasma has been studied extensively in recent years for its potential application as a light source for semiconductor lithography. [2][3][4][5][6][7][8][9] A highbrightness and debris free source emitting at 13.5 nm radiation with 2% full bandwidth (in-band) is necessary for this purpose. The selection of EUV source at 13.5 nm is due to the availability of Si-Mo multilayer (ML) mirrors which reflect $70% of radiation at normal incidence with a bandwidth of 2% centered at 13.5 nm.…”

Section: Introductionmentioning

confidence: 99%

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

et al. 2014

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We investigated the role of a guiding magnetic field on extreme ultraviolet (EUV) and ion emission from a laser produced Sn plasma for various laser pulse duration and intensity. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm, Nd:YAG laser pulses with varying pulse duration (5–15 ns) and intensity. A magnetic trap was fabricated with the use of two neodymium permanent magnets which provided a magnetic field strength ∼0.5 T along the plume expansion direction. Our results indicate that the EUV conversion efficiency do not depend significantly on applied axial magnetic field. Faraday Cup ion analysis of Sn plasma show that the ion flux reduces by a factor of ∼5 with the application of an axial magnetic field. It was found that the plasma plume expand in the lateral direction with peak velocity measured to be ∼1.2 cm/μs and reduced to ∼0.75 cm/μs with the application of an axial magnetic field. The plume expansion features recorded using fast photography in the presence and absence of 0.5 T axial magnetic field are simulated using particle-in-cell code. Our simulation results qualitatively predict the plasma behavior.

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Section: Introductionmentioning

confidence: 99%

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

et al. 2014

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“…(iii) The third factor is related to the two different mechanisms of photon emissions occurring in the two targets. Although the SiC photopeak shows a similar integral electric signal, it is generated by a continuum band emission due to electron bremsstrahlung as the main component emitted from the solid [1] and by a discrete and characteristic UV and SXR emission, due to atomic deexcitations, as the main component emitted from the gas [22,23].…”

Section: Resultsmentioning

confidence: 98%

UV and soft x-ray emission from gaseous and solid targets employing SiC detectors

Torrisi¹,

Wachulak²,

Torrisi³

2021

Plasma Sci. Technol.

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A ns Nd:YAG pulsed laser has been employed to produce plasma from the interaction with a dense target, generating continuum and UV and soft x-ray emission depending on the laser parameters and target properties. The laser hits solid and gaseous targets producing plasma in high vacuum, which was investigated by employing a silicon carbide detector. The two different interaction mechanisms were studied, as well as their dependence on the atomic number. The photon emission from laser-generated plasma produced by solid targets, such as boron nitride (BN) and other elements (Al, Cu, Sn and Ta) and compounds such as polyethylene, has been compared with that coming from plasma produced by irradiating different gas-puff targets based on N2 and other gases (Ar, Xe, Kr, SF6). The experimental results demonstrated that the yields are comparable and, in both cases, increase proportionally to the target atomic number. The obtained results, focusing the attention on the advantages and drawbacks of the employed targets, are presented and discussed.

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“…In our experiment we used two different inner gases, Kr and a mixture of Kr/Xe (90/10), while maintaining He as the outer gas. By using the double gas puff target, a conversion efficiency as high as ∼0.42% has been achieved for a wavelength of 13.5 nm [27], using a Xe/He target. The molecular gases to be irradiated by the SXR radiation from the double gas puff plasma source, are then injected into the vicinity of the LPP source by means of an additional valve ;2 mm in diameter.…”

Section: Methodsmentioning

confidence: 99%

Soft x-ray photoabsorption spectra of photoionized CH₄and CO₂plasmas

Varvarezos

Costello

et al. 2020

J. Phys. B: At. Mol. Opt. Phys.

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In this work we report soft x-ray (SXR) photoabsorption measurements in neutral methane and carbon dioxide molecules and their corresponding photoionized plasmas. The SXR radiation was generated by a table-top laser produced plasma source based on a double stream gas puff target. At low SXR intensities only features related to neutral molecules are present in the absorption spectrum. On the other hand, as the radiation intensity increases, we observe new absorption features in the low photon energy side of the spectrum. In that case fragments such as neutral and ionized molecules, atoms and atomic ions are found to contribute to the absorption spectrum of the plasmas. To our knowledge these are the first measurements where this laser plasma based SXR source is used to both create and probe a molecular plasma. Emphasis is placed on identifying the fragment species and the corresponding transitions.

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Laser-produced plasma EUV source based on tin-rich, thin-layer targets

Cited by 12 publications

References 53 publications

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

UV and soft x-ray emission from gaseous and solid targets employing SiC detectors

Soft x-ray photoabsorption spectra of photoionized CH₄and CO₂plasmas

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Laser-produced plasma EUV source based on tin-rich, thin-layer targets

Cited by 12 publications

References 53 publications

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

UV and soft x-ray emission from gaseous and solid targets employing SiC detectors

Soft x-ray photoabsorption spectra of photoionized CH4and CO2plasmas

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Soft x-ray photoabsorption spectra of photoionized CH₄and CO₂plasmas