1990
DOI: 10.1117/12.22570
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Laser processing of channel waveguide structures in sol-gel coatings

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Cited by 22 publications
(3 citation statements)
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“…One of the limitations is small critical thickness. Usually, the critical thickness of the sol‐gel–derived thin films is about a few hundred nanometers . In most of the previous works, the thickness of the laser densified sol‐gel thin films was less than 500 nm .…”
Section: Introductionmentioning
confidence: 99%
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“…One of the limitations is small critical thickness. Usually, the critical thickness of the sol‐gel–derived thin films is about a few hundred nanometers . In most of the previous works, the thickness of the laser densified sol‐gel thin films was less than 500 nm .…”
Section: Introductionmentioning
confidence: 99%
“…Usually, the critical thickness of the sol-gel-derived thin films is about a few hundred nanometers. 28 In most of the previous works, the thickness of the laser densified sol-gel thin films was less than 500 nm. [29][30][31][32] This thin layer limits its application.…”
mentioning
confidence: 99%
“…The latter consideration allows areas of the same coating to have different properties based on varied firing conditions. A pattern can be written into a sol−gel coating by densification with a laser, and the remaining undense coating can be easily etched away, leaving the pattern . Or, one of the laser firing parameters can be changed continuously as the coated body is fired, producing a film with graded properties.…”
Section: Introductionmentioning
confidence: 99%