1992
DOI: 10.1557/proc-282-185
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Laser-Induced Selective Copper Deposition on Polyimides and Semiconductors

Abstract: It has been demonstrated that copper can be selectively deposited on a variety of substrates including Teflon (polytetrafluroethylene or PTFE), Kapton (polyimide resin), silicon and gallium arsnide from solution by photo-assisted initiated deposition. A copper containing solution was prepared from a mixture of copper(I) chloride (Cu2Ci2) and decaborane (B10H14) in diethyl ether and/or THF (tetrahydrofuran). The copper films were fabricated by ultraviolet photolytic decomposition of copper chloride and polyhedr… Show more

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Cited by 4 publications
(1 citation statement)
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“…Copper lines may readily be deposited onto polyimide [18] or only a palladium activation layer is laser deposited, followed by electrochemical deposition of copper [19]. Even the polyimide surface may be made conductive by laser light irradiation, after which the copper electrodeposition will be possible [20].…”
Section: Laser Direct Writingmentioning
confidence: 99%
“…Copper lines may readily be deposited onto polyimide [18] or only a palladium activation layer is laser deposited, followed by electrochemical deposition of copper [19]. Even the polyimide surface may be made conductive by laser light irradiation, after which the copper electrodeposition will be possible [20].…”
Section: Laser Direct Writingmentioning
confidence: 99%