2016
DOI: 10.1016/j.optlaseng.2015.12.007
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Laser-direct process of Cu nano-ink to coat highly conductive and adhesive metallization patterns on plastic substrate

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Cited by 24 publications
(8 citation statements)
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“…Interestingly, for both thermally sintered thinner and thicker films, films sintered at 150 8C (1 = 1.70 10 À7 W m) were more conductive than those at higher temperatures, with the authors attributing this abnormal behaviour to the internal morphology and surface coverage of the annealed films. [89] Min et al synthesised a Cuf ink complexed with hexylamine and AMP which they sintered using a UV pulsed laser under N 2 after drying the ink at 70 8C for 10 min, resulting in a Cu film on PI with 1 = 1.74 10 À7 W m. [90] Farraj et al sintered a Cuf-AMP ink deposited on a PEN substrate via N 2 plasma and were able to obtain highly conductive Cu films (1 = 7.30 10 À8 W m) in 8 min (four times bulk Cu resistivity). [91] While Cuf-based MOD inks have garnered most of the interest in Cu MOD inks, the last decade has seen a few MOD inks synthesised using alternative Cu salts as starting reagents.…”
Section: Copper Mod Inksmentioning
confidence: 99%
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“…Interestingly, for both thermally sintered thinner and thicker films, films sintered at 150 8C (1 = 1.70 10 À7 W m) were more conductive than those at higher temperatures, with the authors attributing this abnormal behaviour to the internal morphology and surface coverage of the annealed films. [89] Min et al synthesised a Cuf ink complexed with hexylamine and AMP which they sintered using a UV pulsed laser under N 2 after drying the ink at 70 8C for 10 min, resulting in a Cu film on PI with 1 = 1.74 10 À7 W m. [90] Farraj et al sintered a Cuf-AMP ink deposited on a PEN substrate via N 2 plasma and were able to obtain highly conductive Cu films (1 = 7.30 10 À8 W m) in 8 min (four times bulk Cu resistivity). [91] While Cuf-based MOD inks have garnered most of the interest in Cu MOD inks, the last decade has seen a few MOD inks synthesised using alternative Cu salts as starting reagents.…”
Section: Copper Mod Inksmentioning
confidence: 99%
“…Min et al. synthesised a Cuf ink complexed with hexylamine and AMP which they sintered using a UV pulsed laser under N 2 after drying the ink at 70 °C for 10 min, resulting in a Cu film on PI with ρ= 1.74×10 −7 Ω m [90] . Farraj et al.…”
Section: Recent Developments In Metal Inksmentioning
confidence: 99%
“…The further development of this approach has led to significant expansion of the list of materials available for space-selective deposition, including Cu, Pd, Ni, Ag, Ru, Ir, and Pt [ 18 , 19 , 20 , 21 , 22 , 23 , 24 , 25 ]. The deposition process works on both semiconductor and dielectric substrates, which are widely used for photonic (including metamaterials), electronic, optoelectronic, and sensoric applications [ 26 , 27 , 28 ]. However, at the same time, one of the significant drawbacks of the LCLD is the low metallization rate compared to other techniques.…”
Section: Introductionmentioning
confidence: 99%
“…Also, a low temperature sintering is indispensable for organic electronic assemblies. To reduce the sintering temperature, several approaches have been proposed; these include decreasing the particle size, 12,13 the use of Cu-based metal-organic decomposition (MOD) inks, [14][15][16] laser processes, [17][18][19] and photonic sintering. [20][21][22] Concerning the particle size reduction approach, reduction of particle size may lead to easier oxidation in the case of copper, which results in problems with storage.…”
Section: Introductionmentioning
confidence: 99%
“…The lowest resistivity they could obtain was 1.74 Â 10 À5 O cm by using a nanosecond-pulsed ultraviolet laser of 355 nm wavelength and 4.2 W maximum output power. 18 We have also used laser sintering for copper fine particle paste to generate electrically conductive copper film under a hydrogen/argon atmosphere. The films sintered under air showed insulating behaviour towards Cu 2 O, but sintered under H 2 /Ar, the film with a high conductivity of 1.05 Â 10 À5 O cm was obtained.…”
Section: Introductionmentioning
confidence: 99%