Laser cleaning of wafer surfaces and lithography masks

Zapka, Werner; Tam, A. C.; Ziemlich, W.

doi:10.1016/0167-9317(91)90151-3

Cited by 12 publications

(8 citation statements)

References 1 publication

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“…Dans le cas de la décontamination nucléaire, le laser le plus utilisé est celui à fibres. Zapka et al (1991) ont décrit le mécanisme de cette décontamination. Sous les radiations laser, les particules vibrent ce qui diminue l'adhésion de la particule sur la surface.…”

Section: Laserunclassified

Comparaison de l’efficacité de quelques procédés de décontamination surfacique

2009

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Comparison of the efficiency of several methods of surface decontamination.The study of surface decontamination of radioactive waste packages is an important project for EDF in the context of decommissioning. This study has two objectives: firstly, to reduce dosimetry due to the control of non-contaminated area of radioactive waste packages and secondly to ensure the non-contamination of surface parcels as they are sent to their final destination (treatment site and/or storage). This serves to avoid the suspension and the filling of labile activity in the transport of packages that could lead to locally exceeding the regulatory surface contamination threshold. For that purpose, a bibliographical study of the methods of decontaminations proposed in the literature was made. This study allowed seeing if techniques could answer the chosen criteria. Techniques seeming to be able to answer the requirements were then tested to estimate their efficiency. The bibliographical study and the tries of qualification showed that a method seemed more adapted than the others to our problem.

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Section: Laserunclassified

Comparaison de l’efficacité de quelques procédés de décontamination surfacique

2009

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“…5 We have investigated the laser cleaning process. However, it was observed that the 100 mJ/cm 2 KrF laser irradiation of Al or Cu particles on the stencil reticle leads to the particle melting and pattern deformation.…”

Section: Reticle Cleaningmentioning

confidence: 99%

Stencil reticle repair for electron beam projection lithography

Okada

Shimizu

Kawata

et al. 2000

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Repair of stencil reticles for electron beam projection lithography system is one of the critical issues on reticle manufacturing. Focused ion beam deposition is studied as the method for repairing the clear defects of stencil reticle. The film deposition of diamondlike carbon ͑DLC͒ across the stencil pattern, on the sidewall of the stencil, and on the pre-etched slot pattern is demonstrated. The deposited DLC films have good properties as the repair material. Deposited patterns across the stencil pattern are imaged on the resist with the Nikon 100 kV experimental projection column. When the thickness of the deposited DLC film is more than 0.5 m and the contrast aperture size of the projection column is 1.5 mrad, the thickness of the deposited pattern does not affect the critical dimension of the resist pattern imaged the repaired patterns. The profiles, the pattern size, and the electron scattering properties of DLC films are stable for 100 kV electron beam continuous irradiation ͑2 C/cm 2 dosage; corresponding to half-year dosage on electron beam stepper͒. Moreover, the repaired pattern is not damaged by the wet megasonic cleaning.

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“…The particles can obtain large acceleration and be ejected from the surface if this external force is larger than the adhesion force. [11][12][13][14][15] The temperature rise ⌬T of the top surface supporting particles is approximately given by 14…”

Section: Cleaning Mechanismsmentioning

confidence: 99%

“…Recently, laser cleaning was demonstrated to be a new technique to efficiently remove particulate and film contamination from substrate surfaces. [3][4][5][6][7][8][9][10][11] Compared with ultrasonic cleaning, it has several advantages as follows: ͑1͒ it is a dry process without using carbon fluorochloride and other organic solvents, which are harmful to human and environment; ͑2͒ it has high cleaning efficiency; ͑3͒ it is able to remove submicron particles from substrate surfaces; ͑4͒ it offers easy real-time in situ monitoring and area-selective cleaning.…”

Section: Introductionmentioning

confidence: 99%

“…[11][12][13][14][15][16][17] Some researchers use laser irradiation to remove particles and molecular film contamination from optical surfaces such as a mirror in a spaceborne system. 18,19 In order to deposit high quality epitaxial films, the possibility of using laser to remove native oxide and other contaminants on a single-crystal substrate surface for producing an atomically clean surface has been examined.…”

Section: Introductionmentioning

confidence: 99%

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Laser removal of particles from magnetic head sliders

Wei

Hong

et al. 1996

Journal of Applied Physics

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A quantitative investigation of laser-induced removal of particles from magnetic head slider surfaces has been carried out. The damage thresholds of magnetic head sliders for laser fluence and pulse number were found to be about 150 mJ/cm 2 and 5000 pulses at 100 mJ/cm 2 , respectively. For laser fluence or pulse number above the damage threshold, laser irradiation onto magnetic head slider surfaces can cause microcracks around the pole tips. It is found that laser cleaning efficiency increases with increasing laser fluence and pulse number, but does not depend on repetition rate up to 30 Hz. Laser cleaning efficiency of removing particles from magnetic head slider surfaces can reach about 90% for Al particles and 100% for Sn particles, respectively, under appropriate conditions without causing damage. The mechanisms of laser cleaning of particles from magnetic head slider are laser-induced surface vibration, particle vibration, particle thermal expansion, and ablation with high laser fluence, which produce forces strong enough to detach particles from slider surfaces. Based on the above cleaning mechanisms, the dependence of laser cleaning efficiency on laser parameters can be explained.

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Laser cleaning of wafer surfaces and lithography masks

Cited by 12 publications

References 1 publication

Comparaison de l’efficacité de quelques procédés de décontamination surfacique

Comparaison de l’efficacité de quelques procédés de décontamination surfacique

Stencil reticle repair for electron beam projection lithography

Laser removal of particles from magnetic head sliders

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