Large range and high resolution on-line displacement measurement system by combining double interferometres

Xie, Fang; Li, Min; Song, Ding; Sun, Jun-hong; Zhang, Tao

doi:10.1364/oe.18.024961

Cited by 9 publications

(8 citation statements)

References 8 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The proposed fiber interferometer measurement system is shown in Fig.1 [2] .The light emitted from the two lasers with outputs at 1 λ =1558.52 nm and 2 λ =1557.32 nm passes through 3dB-coupler 1, 3dB-coupler 2 before it is divided into two beams. After being collimated by two grin lenses respectively, the two beams are reflected back into the system by measurement mirror and reference mirror.…”

Section: The Proposed Fiber Interferometer Measurement Systemmentioning

confidence: 99%

High precision double-interferometry displacement measurement by waveform transforming based on FFT

Xie

2013

SPIE Proceedings

Self Cite

View full text Add to dashboard Cite

The paper researches on a high precision displacement measurement system mixing double-wavelength interferometry and single-wavelength interferometry by waveform transforming based on Fast Fourier Transform (FFT) technology. The signal of double-wavelength interferometry is used for determining the amplitude of the measurand which makes the measurement range be as large as half a synthetic-wavelength, while that of single-wavelength interferometry is for measuring the value of the measurand precisely which endows the measurement resolution to be as high as less than 1nm, for the amount of the interference fringes of the signal of single-wavelength interferometry during the shifting range of the peak of the signal of double-wavelength interferometry demonstrates the value of the measurand. However, as the signal of double-wavelength interferometry is cosine amplitude modulated, the peak area of it is flatten and the peak position is difficult to be determined, which will influence the measurement precision directly. In order to address the peak position of the double-wavelength interferometric signal accurately, we transform using FFT technology the cosine amplitude modulated signal of double-wavelength interferometry into a triangle-wave amplitude modulated signal to make the peak position prominent. It is very easy to determine the peak position accurately and the amount of the interference fringes of the signal of single-wavelength interferometry during the shifting range of the peak will also be determined precisely. High precision displacement measurement with large range and high resolution could be realized. 1．INTRODUCTIONIn recent years, with the rapid development of semiconductor, advanced manufacturing and other scientific researches, there are great demands for displacement measurements applicable to millimeter range with sub-nanometer resolution. [1] Typically, conventional nanometrology can be divided into two kinds of approaches. One is the non-optical measurement techniques including atomic force microscope ,scanning tunneling microscope, and capactive sensors, etc, of which the measurement ranges are limited to the order of micrometer. Another is the optical measurement techniques including common-focus optical measurement technology and optical interferoemetry. Although the resolution of single-wavelength interferometry is as high as sub-nanometer resolution, the measurement range is only half a wavelength because of phase ambiguity.

show abstract

Section: The Proposed Fiber Interferometer Measurement Systemmentioning

confidence: 99%

High precision double-interferometry displacement measurement by waveform transforming based on FFT

Xie

2013

SPIE Proceedings

Self Cite

View full text Add to dashboard Cite

show abstract

“…Laser also can trace to the definition of length [2]. Because of those features, Laser interferometers are widely applied to many fields which need high accuracy measurement and calibration [3][4][5].…”

Section: Introductionmentioning

confidence: 99%

Linear Displacement and Straightness Measurement by Fabry-Perot Interferometer Integrated with an Optoelectronic Module

Chang

Wang

Chang

et al. 2022

Teh. glas. (Online)

View full text Add to dashboard Cite

This research develops a three degrees of freedom (DOF) measurement system by integrating Fabry-Perot interferometer and photoelectronic inspection module to determine linear displacement, horizontal and vertical straightness geometric error parameters simultaneously. The interferometer and the photoelectronic inspection module in a three DOF measurement system share the same light source, and the two structures are used to measure linear displacement and straightness errors. The experimental results are utilized to calculate the relevant error parameters according to ISO standards and numerical analysis. They show that after the machine error compensation, the positioning deviation of the system is reduced from 55 μm to 19 μm, corresponding to the reduction of 65%. The accuracy is promoted from 65 μm to 31 μm, about the improvement of 52%. The horizontal and vertical straightness errors of the machine are 4.30 μm and 5.71 μm respectively.

show abstract

“…It is usually necessary to remove the part from the machine for off-line metrology and then remount it back to the machine if the part is not fabricated to the specification, increasing the fabrication time and introducing extra errors. Various on-machine metrology or inprocess inspection techniques, 1,2 including hybrid vision system, 3 chromatic confocal, [4][5][6] deflectometry, 7 and interferometry, [8][9][10] have been developed to address this issue. However, all these methods are designed for either measuring surface shape or surface roughness, but not both.…”

Section: Introductionmentioning

confidence: 99%

Dual-mode snapshot interferometric system for on-machine metrology

et al. 2019

View full text Add to dashboard Cite

For the first time, we present a dual-mode snapshot interferometric system for measuring both surface shape and surface roughness to meet the need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and interference microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interferograms simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine.

show abstract

Large range and high resolution on-line displacement measurement system by combining double interferometres

Cited by 9 publications

References 8 publications

High precision double-interferometry displacement measurement by waveform transforming based on FFT

High precision double-interferometry displacement measurement by waveform transforming based on FFT

Linear Displacement and Straightness Measurement by Fabry-Perot Interferometer Integrated with an Optoelectronic Module

Dual-mode snapshot interferometric system for on-machine metrology

Contact Info

Product

Resources

About