2020
DOI: 10.1038/s41565-019-0622-8
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Large-area single-crystal AB-bilayer and ABA-trilayer graphene grown on a Cu/Ni(111) foil

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Cited by 167 publications
(174 citation statements)
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“…These include: 1) the high ratio of hydrogen/methane to terminate the graphene edges with hydrogen atom. The detachment of graphene edges from growth substrate promotes the diffusion of active carbon species into the interface for the formation of bilayer graphene with a yield of 99%; [ 82 ] 2) the designs of high Ni concentration (23%) in Cu−Ni alloy and long growth time for the isothermal growth of bilayer graphene with a yield of 99.4%; [ 83 ] 3) the use of large‐area single‐crystal Cu/Ni(111) alloy with Ni concentration of 16.6% for the formation of bilayer graphene with a yield of almost 100%; [ 84 ] 4) the introduction of ultra‐low‐limit methane concentration (0.01, 0.03, 0.06, and 0.1%) on Cu–Si alloy to produce a SiC layer, achieving the control of graphene layer number from mono‐, bi‐, tri‐, and tetralayer graphene after the sublimation of Si atoms, respectively. [ 85 ] Drawing on these strategies, the uniform tBLG was expected to be formed.…”
Section: The Manufacturing Techniques Of Tblgmentioning
confidence: 99%
“…These include: 1) the high ratio of hydrogen/methane to terminate the graphene edges with hydrogen atom. The detachment of graphene edges from growth substrate promotes the diffusion of active carbon species into the interface for the formation of bilayer graphene with a yield of 99%; [ 82 ] 2) the designs of high Ni concentration (23%) in Cu−Ni alloy and long growth time for the isothermal growth of bilayer graphene with a yield of 99.4%; [ 83 ] 3) the use of large‐area single‐crystal Cu/Ni(111) alloy with Ni concentration of 16.6% for the formation of bilayer graphene with a yield of almost 100%; [ 84 ] 4) the introduction of ultra‐low‐limit methane concentration (0.01, 0.03, 0.06, and 0.1%) on Cu–Si alloy to produce a SiC layer, achieving the control of graphene layer number from mono‐, bi‐, tri‐, and tetralayer graphene after the sublimation of Si atoms, respectively. [ 85 ] Drawing on these strategies, the uniform tBLG was expected to be formed.…”
Section: The Manufacturing Techniques Of Tblgmentioning
confidence: 99%
“…The advantages and disadvantages of this single-nucleus strategy for single-crystal BLG growth are similar to those of SLG grown from a single nucleus, that is, it is not necessary to use a single-crystal substrate, but the growth rate is usually very low. And, if using single crystal Cu/Ni(111) alloy as the substrates, single crystal multilayer graphene islands with three to eight layers and sizes of more than 150 μm have been reported [91].…”
Section: Synthesis Of Single-crystal Blgmentioning
confidence: 99%
“…For example, it has been widely acknowledged that certain kinds of alloy based on Cu provides special merits that allow the precise control of the layer number and domain size, and realize fast growth. [55][56][57] Compared to the Cu substrate, the alloy can be relatively more inexpensive, while further promoting the development of fabrication techniques. The best substrate would be comprehensively determined by the quality and performance of the derived 2D materials, as well as their processability and cost.…”
Section: Perspectives and Prospectsmentioning
confidence: 99%