Laboratory Methods for the Preparation of Boron Carbides

Thévenot, F.

doi:10.1007/978-94-009-2101-6_6

Cited by 8 publications

(1 citation statement)

References 41 publications

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“…The excellent thermal stability and high mechanical strength offered by these materials are desirable for applications in extreme conditions of pressure and temperature. These compounds are synthesized by techniques ranging from carbothermal reduction [ 1 ] for powders to chemical vapor deposition [ 2 ] for whiskers and platelets. However, recent advancements in combining first-principles studies with experimental methods allowed us to deposit crystalline B 50 C 2 thin films by the microwave plasma chemical vapor deposition method [ 3 ].…”

Section: Introductionmentioning

confidence: 99%

Selective Deposition of Hard Boron-Carbon Microstructures on Silicon

et al. 2021

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Boron-rich B-C compounds with high hardness have been recently synthesized by the chemical vapor deposition (CVD) method. In this paper, we present our successful efforts in the selective growth of microstructures of boron-carbon compounds on silicon substrates. This was achieved by combining microfabrication techniques such as maskless lithography and sputter deposition with the CVD technique. Our characterization studies on these B-C microstructures showed that they maintain structural and mechanical properties similar to that of their thin-film counterparts. The methodology presented here paves the way for the development of microstructures for microelectromechanical system (MEMS) applications which require custom hardness and strength properties. These hard B-C microstructures are an excellent choice as support structures in MEMS-based devices.

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Section: Introductionmentioning

confidence: 99%