2019
DOI: 10.1134/s1063782619140136
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J–V Characteristic of p–n Structure Formed on n-GaAs Surface by Ar+ Ion Beam

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Cited by 5 publications
(2 citation statements)
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“…The bulk signal occurred to be rather weak due to attenuation in the upper layer. Figure 2 also shows the presence of interstitial/metallic Ga (Ga-int) in the p-layer at binding energy E B = 18.55 eV discussed elsewhere [2,3]. A kink at binding energy E B = 20.2 eV was revealed also in the doubly differentiated spectrum (not shown here), thus confirming the presence of the bulk n-GaAs contribution.…”
Section: Resultssupporting
confidence: 70%
See 1 more Smart Citation
“…The bulk signal occurred to be rather weak due to attenuation in the upper layer. Figure 2 also shows the presence of interstitial/metallic Ga (Ga-int) in the p-layer at binding energy E B = 18.55 eV discussed elsewhere [2,3]. A kink at binding energy E B = 20.2 eV was revealed also in the doubly differentiated spectrum (not shown here), thus confirming the presence of the bulk n-GaAs contribution.…”
Section: Resultssupporting
confidence: 70%
“…In addition, the effect of a p-n structure formation on the n-GaAs surface by low energy Ar + ions has been observed. J-V characteristics of the created p-n structure revealed the diode effect [3]. The attractiveness of the studied approach for possible applications is that the p-n junction can be formed in a high vacuum locally with the lateral resolution determined by the ion beam diameter without using the wet lithography.…”
Section: Introductionmentioning
confidence: 98%