2020
DOI: 10.1002/anie.201910634
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It's in the Fine Print: Erasable Three‐Dimensional Laser‐Printed Micro‐ and Nanostructures

Abstract: 3D printing, on all scales, is currently a vibrant topic in scientific and industrial research as it has enormous potential to radically change manufacturing. Owing to the inherent nature of the manufacturing process, 3D printed structures may require additional material to structurally support complex features. Such support material must be removed after printing—sometimes termed subtractive manufacturing—without adversely affecting the remaining structure. An elegant solution is the use of photoresists conta… Show more

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Cited by 22 publications
(24 citation statements)
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“…Owing to the high flexibility and the nanoscale spatial resolution of two-photon polymerization direct laser writing (TPP-DLW) lithography, [1][2][3][4][5][6] the application field of nano-and microstructures fabricated by this technique is growing fast. Recent developments cover the areas of photonic devices, [7][8][9] nano-micro-mechanics, [10][11][12] and biomedical applications.…”
mentioning
confidence: 99%
“…Owing to the high flexibility and the nanoscale spatial resolution of two-photon polymerization direct laser writing (TPP-DLW) lithography, [1][2][3][4][5][6] the application field of nano-and microstructures fabricated by this technique is growing fast. Recent developments cover the areas of photonic devices, [7][8][9] nano-micro-mechanics, [10][11][12] and biomedical applications.…”
mentioning
confidence: 99%
“…[ 11 ] Such post‐DLW erasing is for instance a highly enabling feature for the repair of structural defects, for the selective removal of support structures (e.g., to construct hanging objects) and for the degradation of biomimetic cell culturing scaffolds, once these become redundant. [ 12 ] Hereto, it is essential to design advanced photoresists, applicable to laser lithography, that can introduce the desired programmed cleavage into the finally printed materials. Thus far, only a few examples have been reported in which the controlled erasing of laser written microstructures can be achieved through the use of labile linkers that can be cleaved upon heating, [ 13 ] in the presence of reducing agents, [ 14 ] under basic conditions, [ 15 ] or by using light of a wavelength, which differs from that in the writing process.…”
Section: Figurementioning
confidence: 99%
“…In order to fully expand the potential of erasable direct laser written microstructures to the realm of bioengineering applications, however, the development of photoresists that are susceptible to much milder cleavage conditions is a prerequisite. [ 12,17 ] Indeed, elevated temperatures, chemical additives, and organic solvents all generally suffer from biocompatibility issues and should thus ideally be avoided. In pursuit of more viable methods to effect a sustained hydrogel degradation, enzyme‐labile DLW photoresists have been developed which, although in its infancy, are receiving rapidly increasing attention.…”
Section: Figurementioning
confidence: 99%
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“…Demand for scaffold materials with smart properties has stimulated substantial interest in designing photoresists with disparate properties. [25,26] The use of enzymes to degrade materials is a highly attractive option for tissue engineering and regenerative medicine. [10,27] Enzymes are highly chemo, regio-and stereoselective with the capability to work under mild, physiological, and aqueous conditions (pH 5-8, ambient temperature 25-37 °C).…”
Section: Introductionmentioning
confidence: 99%