2005
DOI: 10.1149/1.2097607
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Iron Silicide Formation from Fe Thin-Film Electrodeposition on Hydrogen-Terminated Si(111)

Abstract: We report on the surface morphology, crystalline, and electronic properties of Fe thin films potentiostatically eletrodeposited on hydrogen-terminated Si(111) substrates. Spontaneous reaction between Fe deposits and hydrogen-terminated Si surfaces have been observed at room temperature with formation of polycrystalline silicides normalFe2Si and normalFe5normalSi3 , together with metallic Fe having a body-centered cubic structure. X-ray photoemission spectroscopy and X-ray diffraction measurements have been … Show more

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Cited by 5 publications
(9 citation statements)
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“…The absence of a systematic evolution of the potentiostatic current transients suggests random nucleation at reaction sites followed by diffusion-limited aggregation of the ions, as already reported in other works [18,22]. In other words, diffusion-limited steady currents are attained after a nucleation mode between instantaneous and progressive nucleation, as described by Scharifker and Hills [28].…”
Section: Electrochemical Analysessupporting
confidence: 73%
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“…The absence of a systematic evolution of the potentiostatic current transients suggests random nucleation at reaction sites followed by diffusion-limited aggregation of the ions, as already reported in other works [18,22]. In other words, diffusion-limited steady currents are attained after a nucleation mode between instantaneous and progressive nucleation, as described by Scharifker and Hills [28].…”
Section: Electrochemical Analysessupporting
confidence: 73%
“…At the end of the cyclic voltammogram, i.e., in the potential region of −900 to 0 mV, an anodic current is observed. As previously described, this anodic region can be assigned with oxidation of Fe to Fe 2+ and Fe 2+ to Fe 3+ (or Fe to Fe 3+ in some part) [22,24]. The reduction wave, as well as cathodic and anodic current peaks, becomes larger and more intense with addition of Co.…”
Section: Electrochemical Analysesmentioning
confidence: 59%
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