IR laser-induced co-decomposition of trisilane and thiirane for deposition of polycarbosilthiane films

IR laser-induced co-decomposition of gaseous trisilane and carbon disulfide

“…H 2 SiS 2 ! H 2 S + SiS) [28], but the recorded FTIR spectra do not allow to distinct whether this gas-phase reactive species survives or is trapped with silylenes to yield silthiane polymer.…”

“…Thus, the IR laser-induced co-decomposition of dimethyl selenide and trisilane [26] or dimethyl selenide and www.elsevier.com/locate/jaap 1,3-disilacyclobutane [27] yields gaseous SiSe and affords chemical vapor deposition of nanostructured H/Si/Se/C films. In addition, the IR laser co-decomposition of trisilane and thiirane allows gas-phase formation of SiS and chemical vapor deposition of polycarbosilthiane films [28].…”