Ionic desorption from intrinsically conducting polymer films based on polypyrrole induced by high energy electrons and soft X-ray synchrotron radiation

Arantes, C.; Rocco, Ana Maria; Rocco, Maria Luiza M.

doi:10.1016/j.elspec.2009.08.001

Cited by 3 publications

(3 citation statements)

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“…To improve figure analysis the intensity scale was enlarged and divided into different mass ranges. Similar to other reported ESID analysis of organic compounds H + ion is the main species desorbed after electron bombardment, followed by heavier fragments with lower intensity. Peak assignment of the siloxane fragments in the ESID spectra (Table ) was performed considering the TOF‐SIMS results and ESID spectra obtained with low energy electrons (energy ≤70 eV) previously reported.…”

Section: Resultssupporting

confidence: 89%

“…In the case of C m H n + species showed in Figure we can observe two maxima at energies corresponding to about two‐three times the C K ‐edge (290 eV) and the O K ‐edge (530 eV), respectively. This means that two different sites are contributing to the fragmentation and desorption of these species and can be interpreted in terms of the ASID (Auger stimulated ion desorption) mechanism . Similar behavior is observed for silicon ionic fragments (Si + and SiCH 3 + ) in Figure .…”

Section: Resultssupporting

confidence: 64%

“…Different elements can be probed and chemical shifts explored. Another important process, leading also to fragmentation and desorption of ionic species, is due to energetic Auger electrons, photoelectrons, and secondary electrons, most of them originated in the bulk, the so‐called XESD (X‐ray induced electron stimulated desorption) process …”

Section: Introductionmentioning

confidence: 99%

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Organic-Inorganic Behavior of Plasma-Polymerized Hexamethyldisiloxane Films Studied by Electron and Photon Induced Ion Desorption

Veiga

Garcia-Basabe

Schmittgens

et al. 2013

Plasma Process. Polym.

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In the present work two thin films, fabricated by plasma-polymerization of hexamethyldisiloxane (HMDSO) monomer, were studied by a combination of electron (ESID) and photon (PSID) stimulated ion desorption techniques. The organic character of the polymer film is evidenced by the high contribution of C 2 H þ n species and the absence of high mass fragments in its ESID spectrum. On the other hand, the inorganic character is elucidated by the presence of high mass silicon ionic fragments. NEXAFS and PSID spectra also show clear differences between organic and inorganic films. The marked reduction of CH þ 3 species for PSID spectra of the organic-polymeric film is in accordance with ESID analysis and may be interpreted by a screening effect of its cross-linked organic structure.

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Section: Resultssupporting

confidence: 89%

Section: Resultssupporting

confidence: 64%

Section: Introductionmentioning

confidence: 99%

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