Organic-Inorganic Behavior of Plasma-Polymerized Hexamethyldisiloxane Films Studied by Electron and Photon Induced Ion Desorption

Abstract

In the present work two thin films, fabricated by plasma-polymerization of hexamethyldisiloxane (HMDSO) monomer, were studied by a combination of electron (ESID) and photon (PSID) stimulated ion desorption techniques. The organic character of the polymer film is evidenced by the high contribution of C 2 H þ n species and the absence of high mass fragments in its ESID spectrum. On the other hand, the inorganic character is elucidated by the presence of high mass silicon ionic fragments. NEXAFS and PSID spectra also show clear differences between organic and inorganic films. The marked reduction of CH þ 3 species for PSID spectra of the organic-polymeric film is in accordance with ESID analysis and may be interpreted by a screening effect of its cross-linked organic structure.