Ion sources for ion beam assisted thin-film depositiona)

Ensinger, Wolfgang

doi:10.1063/1.1143432

Cited by 61 publications

(16 citation statements)

References 89 publications

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“…Three of them are widely used in standard industrial ion assisted deposition processes [3][4][5] : the Denton CC-105 6-8 , the Leybold APS 9,10 , and the Veeco Mark II [11][12][13] . With the main focus on the Denton CC-105 and the Leybold APS, these ion and plasma sources were characterized in order to acquire a detailed knowledge on the typical operation parameters and their dependencies in respect to the ion energies and ion current densities.…”

Section: Characterization Of the Ion Sourcesmentioning

confidence: 99%

Ion-assisted deposition processes: industrial network IntIon

Ehlers

Becker²,

Beckmann³

et al. 2004

SPIE Proceedings

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The presented work is embedded in the research network "Integrative Ion Processes for Modern Optics", called IntIon, consisting of 12 partners from the German optics industry and two research institutes. The main target of the IntIon network is the development of new process concepts on the basis of ion assisted deposition (IAD) for the industrial production of optical thin film components. Besides an improvement in efficiency, a major aim is concentrated on the optical characteristics for selected application fields with high economical potential. In this network, different ion and plasma sources are compared with regard to their qualification for ion assisted deposition processes. This work includes the characterization of the ion energy and ion current using Faraday-cup measurements. The selection of investigated coating materials includes a broad variety of standard and non-standard oxides. First results of the network will be presented for adapted deposition materials and different operation characteristics of ion sources.

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Section: Characterization Of the Ion Sourcesmentioning

confidence: 99%

Ion-assisted deposition processes: industrial network IntIon

Ehlers

Becker²,

Beckmann³

et al. 2004

SPIE Proceedings

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“…Преобладание того или иного может определяться, в том числе, и расположением в ИСО-установке источника ионов относительно подложки. При варианте, когда источник расположен под углом 30, 45 [50,72] преобладает поверхностный механизм, при расположении источника в одной плоскости с электронно-лучевым испарителем, когда поток атомов хрома и ионный поток составляют практически единое целое [67], будет доминировать объемный механизм.…”

Section: 2unclassified

“…Кроме этого, позднее были разработа-ны ионно-стимулирующие методы, в которых поток атомов и моле-кул металла создавался изолировано от газового потока [50]. Иссле-дование эксплуатационных характеристик таких покрытий показа-ло значительное их превосходство над аналогичными характеристи-ками электроосажденного хрома [10][11][12], хотя, по мере увеличения количества исследований в данном направлении, стало очевидным, что свойства Cr-N покрытий кардинальным образом зависят от их структуры, а, следовательно, от способа их получения [13][14][15].…”

Section: Introductionunclassified

Coatings on the Basis of Chromium Nitride. Experience of Design and Investigation

Gyglya

Neklyudov

2005

Usp. Fiz. Met.

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В обзоре систематизированы результаты исследований последних 25 лет в области получения и применения Cr-N-покрытий, создаваемых с помощью вакуумно-дуговых, магнетронных и ионно-стимулированных технологий. Проанализирована взаимосвязь между базовыми параметрами процессов, такими как давление рабочего газа, энергия ионов, степень ионизации, по-тенциал смещения и др., и структурно-фазовыми, механическими и трибо-логическими характеристиками покрытий. Выявлены характерные отли-чия в условиях получения покрытий CrN и Cr 2 N. Проведено сравнение экс-плуатационных свойств Ti-N-и Cr-N-покрытий.У даному огляді систематизовано результати досліджень за останні 25 ро-ків у галузі одержання та використання Cr-N-покриттів, які створюються за допомогою вакуумно-дугових, магнетронних та йонно-стимульованих технологій. Проаналізовано взаємозв'язок між базовими параметрами про-цесів, такими як тиск робочого газу, енергія йонів, ступінь йонізації, по-тенціял зміщення та ін., і структурно-фазовими, механічними та триболо-гічними характеристиками покриттів. Виявлено характерні відмінності в умовах створення покриттів CrN та Cr 2 N. Виконано порівняння експлуата-ційних властивостей Ti-N-та Cr-N-покриттів.The investigation results concerning fabrication and application of Cr-N coatings, which are produced by the vacuum-arc evaporation, magnetron sputtering, and ion beam-assisted deposition, are systematized. The links between base parameters of these processes such as gas pressure, ion energy, ionization degree, bias potential and structure, mechanical, and tribological characteristics are analyzed. The characteristic differences of fabrication conditions for CrN and Cr 2 N coatings are revealed. The comparison of performance attributes of Ti-N and Cr-N coatings is carried out.Ключевые слова: покрытия Cr-N и Ti-N, вакуумно-дуговое испарение, магнетронное распыление, ионно-стимулированное осаждение.Успехи физ. мет. / Usp. Fiz. Met. 2005, т. 6, сс. 197-232 Îòòèñêè äîñòóïíû íåïîñðåäñòâåííî îò èçäàòåëÿ Ôîòîêîïèðîâàíèå ðàçðåøåíî òîëüêî â ñîîòâåòñòâèè ñ ëèöåíçèåé 2005 ÈÌÔ (Èíñòèòóò ìåòàëëîôèçèêè èì. Ã. Â. Êóðäþìîâà ÍÀÍ Óêðàèíû) Íàïå÷àòàíî â Óêðàèíå.

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“…In the case of ion implantation, there are much of examples of multi-component implantation (gas and metal ions) being more effective comparing to a single component one; 1,2 it is also known that IBAD is the effective technique for the dense thin films deposition, having much of advantage over the conventional deposition techniques for the process and coating properties control. 3,4 Usually, for the tasks of multi-component beams treatment, subsequent treatments with two or more ion species are applied, or, the combined systems where two or more ions or atoms sources are utilized for simultaneous treatment. 5,6 Industrial application of those systems should be rather expensive and complex for the operation and control.…”

Section: Introductionmentioning

confidence: 99%

“…(2) ion-beam assisted deposition (IBAD) of multi-component layers; (3) ion-beam mixing for nanostructures or interlayers formation and other. Application of multi-component beams can provide significant advantage for the materials treatment process both from technological and from economic points of view.…”

Section: Introductionmentioning

confidence: 99%

Influence of ion source configuration and its operation parameters on the target sputtering and implantation process

Shal’nov

Kukhta

Uemura

et al. 2012

Review of Scientific Instruments

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In the work, investigation of the features and operation regimes of sputter enhanced ion-plasma source are presented. The source is based on the target sputtering with the dense plasma formed in the crossed electric and magnetic fields. It allows operation with noble or reactive gases at low pressure discharge regimes, and, the resulting ion beam is the mixture of ions from the working gas and sputtering target. Any conductive material, such as metals, alloys, or compounds, can be used as the sputtering target. Effectiveness of target sputtering process with the plasma was investigated dependently on the gun geometry, plasma parameters, and the target bias voltage. With the applied accelerating voltage from 0 to 20 kV, the source can be operated in regimes of thin film deposition, ion-beam mixing, and ion implantation. Multi-component ion beam implantation was applied to α-Fe, which leads to the surface hardness increasing from 2 GPa in the initial condition up to 3.5 GPa in case of combined N(2)-C implantation. Projected range of the implanted elements is up to 20 nm with the implantation energy 20 keV that was obtained with XPS depth profiling.

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Ion sources for ion beam assisted thin-film depositiona)

Abstract: Reactive ion beam assisted deposition of zirconium oxyfluoride thin films

Cited by 61 publications

References 89 publications

Ion-assisted deposition processes: industrial network IntIon

Ion-assisted deposition processes: industrial network IntIon

Coatings on the Basis of Chromium Nitride. Experience of Design and Investigation

Influence of ion source configuration and its operation parameters on the target sputtering and implantation process

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