1998
DOI: 10.1016/s0038-1101(97)00221-9
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Ion irradiation induced defects in epitaxial GaAs layers

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Cited by 7 publications
(7 citation statements)
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“…Samples with doping levels ranging from 10 15 to 10 18 cm ± ±3 were used in order to determine the dependence of the damage factor on the background donor concentration [6,13]. Samples with doping levels ranging from 10 15 to 10 18 cm ± ±3 were used in order to determine the dependence of the damage factor on the background donor concentration [6,13].…”
Section: Methodsmentioning
confidence: 99%
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“…Samples with doping levels ranging from 10 15 to 10 18 cm ± ±3 were used in order to determine the dependence of the damage factor on the background donor concentration [6,13]. Samples with doping levels ranging from 10 15 to 10 18 cm ± ±3 were used in order to determine the dependence of the damage factor on the background donor concentration [6,13].…”
Section: Methodsmentioning
confidence: 99%
“…a-particle irradiation generates traps in GaAs some of which are similar to those introduced by electron and heavy ion irradiation [6,13,14]. Therefore, the investigation of a-particle irradiation degradation of GaAs MESFETs can be considered to be of significant importance for the basic research in understanding the physical mechanisms of the material degradation as well as the applied research on the device engineering.…”
Section: Introductionmentioning
confidence: 99%
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“…The absorption bands leveled at 0.88-0.90, 0.91, and 0.99 eV are possibly related to the F-series defect that correlate to the recoiled Ga and As atoms displaced during implantation. 15 The peaks leveled at 1.075 eV are attributed to the n-type electron trap E3. 16 The defect leveled at 1.11 eV with an E a of 0.32 eV is identified as I5 with a complex nature, which is thought to be formed by association between primary formed defects (V As ϪAs I or the Frankel pairs͒ and contaminating impurities.…”
Section: Communications Optical Transmission Spectroscopy Of Semi-insmentioning
confidence: 99%