Ion energy distribution effects on degradation of optical properties of ion-bombarded copper mirrors

Bardamid, A. F.; Gritsyna, V.T.; Konovalov, V.G.; Orlinskii, D. V.; Shapoval, A. N.; Shtan, A. F.; Solodovchenko, S. I.; Voitsenya, V. S.; Yakimov, K. I.

doi:10.1016/s0257-8972(98)00421-6

Cited by 37 publications

(50 citation statements)

References 9 publications

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“…Sputtering was performed by exposing specimens to plasma ions in a double mirror magnetic configuration [1]. Electron cyclotron resonance plasmas with densities of ~10 16 ions/m 3 and electron temperature of ~5 eV in deuterium or argon were used as a source of incident particles.…”

Section: Experimental Techniquementioning

confidence: 99%

“…(In some cases, an even shorter exposure to low energy Ar plasma ions was applied for cleaning instead.) The reflectance at normal incidence in the wavelength range 220-650 nm, and the mass loss due to sputtering (to give the average sputter depth Δh) was measured after exposures (more details in [1]). Thus the rate of degradation of optical properties on the thickness of sputtered layer was found.…”

Section: Experimental Techniquementioning

confidence: 99%

“…Under the influence of high-fluence ion bombardment highly-polished mirrors fabricated from polycrystalline metals are observed to develop a complex step structure relief [1][2][3], attributed to the difference of the sputtering yield of grains with different crystal orientation relative to the surface [3]. The relief can be characterized with modern microscopy methods as optical interference microscopy, confocal laser scanning microscopy (CLSM), atomic force microscopy (AFM), scanning tunneling microscopy (STM), and scanning electron microscopy (SEM) with electron backscatter diffraction (EBSD).…”

Section: Introductionmentioning

confidence: 99%

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Development of surface relief on polycrystalline metals due to sputtering

Voitsenya

Balden

Bardamid

et al. 2013

Nuclear Instruments and Methods in Physics Research Section B:

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The characteristics of surface microrelief that appear in sputtering experiments with polycrystalline metals of various grain sizes have been studied. Specimens with grain sizes varying from 30 -70 nm in the case of crystallized amorphous alloys, to 1 -3 µm for technical tungsten grade and 10 -100 μm for recrystallized tungsten were investigated. A model is proposed for the development of roughness on polycrystalline metals which is based on the dependence of sputtering rate on crystal orientation. The results of the modeling are in good agreement with experiments showing that the length scale of roughness is much larger than the grain size. Voitsenya et al.Surface relief due to sputtering of polycrystalline metals

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Section: Experimental Techniquementioning

confidence: 99%

Section: Experimental Techniquementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Development of surface relief on polycrystalline metals due to sputtering

Voitsenya

Balden

Bardamid

et al. 2013

Nuclear Instruments and Methods in Physics Research Section B:

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“…In agreement with the results of [7] the areas composed dominantly of grains with orientation close to (110) have highest sputtering rate, forming "valleys", and the areas composed dominantly of grains with orientation close to (100) have much lower sputtering rate forming the main parts of "ridges" with "peaks" composed of grains close to (111) orientation having lowest sputtering rate. Such surface relief is very much different from the relief of polycrystalline mirror specimens being sputtered under similar conditions [7,10,11,14], and this is a consequence of a quite complicated technology procedures used for preparation of this particular tungsten kind. Note that surface peculiarities due to sputtering are qualitatively similar for undamaged and damaged specimens, independently on the dose (0.3 or 3.0 dpa).…”

Section: Methodsmentioning

confidence: 98%

“…The initial reflectance of specimens was found to be noticeably below the nominal values for W [9], therefore a "soft" cleaning of their surfaces was provided in the DSM-2 device [10,11] before sputtering procedures were started. The rear sides (not irradiated with W +6 ions) were cleaned by exposing to low energy (~60 eV) ions of deuterium plasma (ion fluence 1.8x10 23 m -2 ), and the face sides (irradiated) -by short time exposing to ions of Ar plasma with ion energy of 200 eV (ion fluence 2x10 22 m -2 ).…”

Section: Methodsmentioning

confidence: 99%

Effect of sputtering on self-damaged ITER-grade tungsten

Voitsenya

Balden

Bardamid

et al. 2014

Journal of Nuclear Materials

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Abstract. Simulation of neutron irradiation and sputtering on ITER-grade tungsten was studied. The effects of neutron-induced displacement damage have been simulated by irradiation of tungsten target with W 6+ ions of 20 MeV energy. Bombardment by Ar + ions with energy 600 eV was used as imitation of impact of charge exchange atoms in ITER. The sputtering process was interrupted to perform in between measurements of the optical properties of the eroded surface and the mass loss. After sputtering was finished, the surface was thoroughly investigated by different methods for characterising the surface relief developed due to sputtering. The damaging to, at least, the level that would be achieved in ITER does not lead to a decisive additional contribution to the processes under impact of charge exchange atoms only.

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