Ion beam mixing in insulator substrates

Metal Nanoclusters: Electronic Aspects and Physico-Chemical Characterization

“…In general, events following the impact of energetic ions belong to one of two categories [150][151][152]. According to the literature, nanoparticle formation in heavily ion-implanted ceramics [155], glasses [156,157] oxides, or even semiconductors [158][159][160][161] can be understood by the dominance of these chemically guided demixing processes over ballistic mixing. The ballistic processes create a highly nonequilibrium state with a huge number of lattice defects, which then relaxes towards a lower free energy state by diffusion processes (radiation enhanced diffusion) in the second category of the radiation aftereffects.…”

Ion Irradiation‐Induced Sinking of Ag Nanocubes into Substrates

“…This includes the capability to describe correctly the electronic and nuclear stopping mechanisms, [1][2][3] damage formation, [4,5] channeling of ions, [6][7][8][9][10][11][12][13][14] sputtering of surfaces [15,16] as well as ion beam mixing at interfaces. [17][18][19][20][21] Many appropriate simulation tools are thus available for ion irradiation of bulk objects and thin films. [22][23][24][25][26] Today, being in an era of nanotechnology, the irradiated object sizes are often comparable to the projected ion range, which led to the discovery of many new effects, as the situation is different to the ion irradiation of bulk or thin films.…”

“…This includes the capability to describe correctly the electronic and nuclear stopping mechanisms, [ 1–3 ] damage formation, [ 4,5 ] channeling of ions, [ 6–14 ] sputtering of surfaces [ 15,16 ] as well as ion beam mixing at interfaces. [ 17–21 ] Many appropriate simulation tools are thus available for ion irradiation of bulk objects and thin films. [ 22–26 ]…”