“…Optimization of the ion bombardment conditions can also modulate the morphology, density, stress level, crystallinity, and chemical composition of the as-produced fi lms with excellent adhesion to the substrates. IBAD has been previously applied and studied for ZrO 2 fi lm deposition [25,26] using argon ions in the kiloelectronvolt energy range which resulted apparently in non-stoichiometric opaque zirconia. We have also observed similar results in our laboratory when only Ar ions, especially with high energy ions and high current density, were used to fabricate ZrO 2 fi lms.…”