Ion beam erosion of amorphous materials: evolution of surface morphology

Toma, Andréa; Mongeot, F. Buatier de; Buzio, Renato; Firpo, Giuseppe; Bhattacharyya, S. R.; Boragno, C.; Valbusa, U.

doi:10.1016/j.nimb.2004.12.099

Cited by 61 publications

(42 citation statements)

References 10 publications

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“…Although this ripple rotation has been confirmed on various materials like metals [40,61], SiO

_{2}

[1,44,60,62], and graphite [36], the formation of ripple patterns oriented parallel to the direction of the ion beam at grazing incidence seems to be suppressed on Si surfaces at room temperature, so that only shallow anisotropic structures have been observed [101,102] that do not resemble the well ordered patterns obtained at elevated sample temperature [5,72]. However, recent experiments by Mollick and Ghose [103] showed that the formation of a clearly developed rotated ripple pattern under

80^{\circ}

incidence can be induced also at room temperature by a chemical pre-roughening of the Si surface which is known to influence the dynamics of the pattern development [45,91].…”

Section: Morphology Of Ion-sputtered Si Surfacesmentioning

confidence: 96%

Ion-Induced Nanoscale Ripple Patterns on Si Surfaces: Theory and Experiment

2010

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Nanopatterning of solid surfaces by low-energy ion bombardment has received considerable interest in recent years. This interest was partially motivated by promising applications of nanopatterned substrates in the production of functional surfaces. Especially nanoscale ripple patterns on Si surfaces have attracted attention both from a fundamental and an application related point of view. This paper summarizes the theoretical basics of ion-induced pattern formation and compares the predictions of various continuum models to experimental observations with special emphasis on the morphology development of Si surfaces during sub-keV ion sputtering.

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“…Although this ripple rotation has been confirmed on various materials like metals [40,61], SiO

_{2}

80^{\circ}

incidence can be induced also at room temperature by a chemical pre-roughening of the Si surface which is known to influence the dynamics of the pattern development [45,91].…”

Section: Morphology Of Ion-sputtered Si Surfacesmentioning

confidence: 96%

Ion-Induced Nanoscale Ripple Patterns on Si Surfaces: Theory and Experiment

2010

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“…A biased tungsten filament (V bias = −13V), providing electrons by thermoionic emission, was placed close to the extraction grid in order to compensate surface charging due to ion implantation. After an ion dose of about 2.8 × 10 19 ionscm −2 , the morphology evolved into a well ordered ripple pattern, which extends uniformly over large areas (∼cm 2 scale) with a wavevector mainly oriented parallel to the ion beam projection on the surface [14].…”

Section: Methodsmentioning

confidence: 99%

Channeling motion of gold nanospheres on a rippled glassed surface

et al. 2014

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Gold nanospheres have been manipulated by atomic force microscopy on a rippled glass surface produced by ion beam sputtering and coated with an ultrathin (10 nm thick) graphitic layer. This substrate is characterized by irregular wavy grooves running parallel to a preferential direction. Measurements in ambient conditions show that the motion of the nanoparticles is confined to single grooves ('channels'), along which the particles move till they are trapped by local bottlenecks. At this point, the particles cross the ripple pattern in a series of consecutive jumps and continue their longitudinal motion along a different channel. Moreover, due to the asymmetric shape of the ripple profiles, the jumps occur in the direction of minimum slope, resembling a ratchet mechanism. Our results are discussed, extending a collisional model, which was recently developed for the manipulation of nanospheres on flat surfaces, to the specific geometry of this problem.

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“…Low-energy ion beam sputtering (IBS) is a powerful bottom-up technology for generating diverse self-organized nanostructures, such as ripples and dots on different materials including amorphous SiO 2 [1][2][3][4][5][6][7], single crystalline Si [8][9][10][11][12], Ge [10,13] and Ag [14], as well as compound semiconductors GaSb [15] and InP [16]; the IBS technology offers the potential to achieve high throughput and fabrication of large areas [10,[17][18][19]. Ion beam parameters (species, incidence angle, energy, flux, etc) and substrate parameters (material, temperature, initial surface topography, etc) interact to generate the features of such nanopatterns.…”

Section: Introductionmentioning

confidence: 99%

Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

et al. 2017

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The ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is extended to a pre-rippled binary compound surface of fused silica (SiO 2 ). The dependence of the rms roughness and the deposited amount of Al on the distance from the Al source under Ar + IBS with Al co-deposition was investigated on smooth SiO 2 , pre-rippled SiO 2 , and smooth Si surfaces, using atomic force microscopy and X-ray photoelectron spectroscopy. Although the amounts of Al deposited on these three surfaces all decreased with increasing distance from the Al target, the morphology and rms roughness of the smooth Si surface did not demonstrate a strong distance dependence. In contrast to smooth Si, the rms roughness of both the smooth and pre-rippled SiO 2 surfaces exhibited a similar distance evolution trend of increasing, decreasing, and final stabilization at the distance where the results were similar to those obtained without Al co-deposition. However, the pre-rippled SiO 2 surfaces showed a stronger modulation of rms roughness than the smooth surfaces. At the incidence angles of 60° and 70°, dot-decorated ripples and roof-tiles were formed on the smooth SiO 2 surfaces, respectively, whereas nanostructures of closely aligned grains and blazed facets were generated on the pre-rippled SiO 2 , respectively. The combination of impurity co-deposition with pre-rippled surfaces was found to facilitate the formation of novel types of nanostructures and morphological growth. The initial ripples act as a template to guide the preferential deposition of Al on the tops of the ripples or the ripple sides facing the Al wedge, but not in the valleys between the ripples, leading to 2D grains and quasiblazed grating, which offer significant promise in optical applications. The rms roughness enhancement is attributed not to AlSi, but to AlO x F y compounds originating mainly from the Al source.

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Ion beam erosion of amorphous materials: evolution of surface morphology

Cited by 61 publications

References 10 publications

Ion-Induced Nanoscale Ripple Patterns on Si Surfaces: Theory and Experiment

Ion-Induced Nanoscale Ripple Patterns on Si Surfaces: Theory and Experiment

Channeling motion of gold nanospheres on a rippled glassed surface

Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

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