Ion-beam characteristics of the metal cluster complex of Ir4(CO)12

Abstract

Articles you may be interested inNeutralization of space charge on high-current low-energy ion beam by low-energy electrons supplied from silicon based field emitter arrays AIP Conf.Investigation of a rf inductively coupled plasma ion source capable of highly uniform and collimated ion-beam generation Rev. Sci. Instrum. 77, 03B515 (2006); 10.1063/1.2172349Experimental study of electron-and ion-beam properties on the BNL electron-beam ion source and comparison with theoretical models Rev. Sci. Instrum. 77, 03A910 (2006); 10.1063/1.2149377 Current research and development topics on gas cluster ion-beam processesTetrairidium dodecacarbonyl, Ir 4 ͑CO͒ 12 , is a metal cluster complex which has a molecular weight of 1104.9. Using a metal-cluster-complex ion source, it has been demonstrated that stable ion beams of Ir 4 ͑CO͒ 7 + were produced. Energy dependence of sputtering yield of silicon bombarded with Ir 4 ͑CO͒ 7 + ions was investigated at a beam energy from 2 to 10 keV at normal incidence. Experimental results showed that the sputtering yield varied substantially with beam energy. The sputtering yield at 10 keV was higher than that with SF 5 + or Ar + ions by a factor of 3-24, whereas the sputtering yield at 3 keV was lower than that with Ar + ions. In the case of 2 keV, deposition was found to occur. The substantial variation in the sputtering yields was examined using empirical equations for calculating sputtering yields. It was shown that the high sputtering yield at 10 keV would be due to what is called "nonlinear effect" unique to complex-projectile bombardment. It was also indicated that the substantial variation in the sputtering yield would result from lower kinetic energies of each atom constituting the cluster ions. Further, the deposition was explained by considering changes in surface properties caused by the irradiation of the cluster ions.

Time‐of‐Flight secondary ion mass spectrometry (TOF‐SIMS) using the metal‐cluster‐complex primary ion of Ir4(CO)7+

“…[16] Hence, it is very likely that the enhancement of secondary ion intensity will result from the increase in sputtering yield. However, for a more detailed understanding of the effect of Ir 4 (CO) 7 + bombardment, further study will be required.…”

“…Details of the metal-cluster-complex ion source have been reported previously. [16,19] Briefly, it consists of a crucible holding the metal-cluster-complex, an electron-impact ionizer, an extractor, a Wien filter and an Einzel lens for focusing ion beams. By electron-impact ionization, fragment ions such as Ir 4 (CO) n + (n = 0-12) are formed; the most predominantly formed ions are Ir 4 (CO) 7 + .…”

“…By electron-impact ionization, fragment ions such as Ir 4 (CO) n + (n = 0-12) are formed; the most predominantly formed ions are Ir 4 (CO) 7 + . [15,16] By adjusting the Wien-filter voltage, the ion species of metal-cluster-complex ions are selected. In the present study, ion beams containing mainly Ir 4 (CO) 7 + ions were produced.…”

Ion Sources Used for Secondary Ion Mass Spectrometry

“…of Os 3 (CO) n + to SIMS analysis, Ir 4 (CO) 7 + was successfully utilized for SIMS applications. 35 …”

New design and development of size‐selected gas cluster SIMS

“…C 60 + [5,6], and Ir 4 (CO) 7 + [7], have been used as projectiles for TOF-SIMS. These ions have improved the secondary ion yield and reduced sample damage to some extent.…”