Ion-beam-assisted deposition of Ni/C multilayer X-ray mirrors

Puik, E. J.; Wiel, M.J. van der; Verhoeven, J.; Zeijlemaker, H.

doi:10.1016/0040-6090(90)90231-2

Cited by 21 publications

(9 citation statements)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Nevertheless, the high chemical stability of carbide as well as pure carbon will result in a low chemical reactivity at interfaces with other materials. This prevents intermixing but can be the cause that other materials grow with a high surface roughness due to initial island formation [21,22].…”

Section: Resultsmentioning

confidence: 99%

Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

et al. 2006

View full text Add to dashboard Cite

Section: Resultsmentioning

confidence: 99%

Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

et al. 2006

View full text Add to dashboard Cite

“…From the initial increase of the reflected intensity after starting the nitrogen ion etch a reduction of the surface roughness can be observed as an additional effect. 13 From the best simulation that fits the evolution of the reflected intensity for growth of the nickel overlayer, the maxima and minima are shown in Fig. 2͑b͒ as dots.…”

Section: Resultsmentioning

confidence: 99%

Ni/Si based multilayer for the reflection of soft x rays in the “water window”

Cilia¹,

Verhoeven²

1997

Journal of Applied Physics

View full text Add to dashboard Cite

As nickel and silicon have no absorption edges in the “water window” (2.4–4.4 nm), these materials form suitable components for multilayers to be applied as optical components in this wavelength region. The practical feasibility of using these components is limited by their chemical reactivity, resulting in intermixing at the interfaces. A procedure, based on the application of ion implantation and ion beam mixing, has been developed to produce silicon nitride and nickel silicide layers. As these processes also cause ion etching, an additional reduction of the surface roughness of the layers has been observed.

show abstract

“…In sputter deposition, these ions are a byproduct of the sputtering of primary target material, but in cross-beam sputter deposition and ion-beam-assisted deposition, the ion beam is specifically directed at the growing surface. This is also true for the technique of ion polishing, pioneered by Spiller 1 and by Puik et al 2 for the deposition of x-ray multilayer mirrors. In this technique, deposition of a layer is followed by ion-beam erosion of a certain excess thickness of the layer until the desired final thickness is reached.…”

Section: Introductionmentioning

confidence: 89%

Evolution of surface morphology during growth and ion erosion of thin films

1996

View full text Add to dashboard Cite

A model is presented to describe the evolution of thin-film surface morphology during growth and ion erosion. Characteristic in-plane length scales and overall amplitude of the roughness are studied as a function of certain competing roughening and smoothing mechanisms. Particular attention is paid to the deposition method of growth followed by ion erosion of an excess layer thickness. The model is extended to the case of multilayers, to include roughness correlations between different interfaces. Specular and diffuse x-rayscattering measurements on Mo/Si multilayers are interpreted in terms of the model. Quantitative agreement between the model and the experimental data can be obtained if we assume viscous flow to be the dominant smoothing mechanism during ion erosion of the Si layers.

show abstract

Ion-beam-assisted deposition of Ni/C multilayer X-ray mirrors

Cited by 21 publications

References 4 publications

Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

Ni/Si based multilayer for the reflection of soft x rays in the “water window”

Evolution of surface morphology during growth and ion erosion of thin films

Contact Info

Product

Resources

About