Investigations on the energy influx at plasma processes by means of a simple thermal probe

Kersten, Holger; Rohde, D; Berndt, Johannes; Deutsch, Hans‐Peter; Hippler, R.

doi:10.1016/s0040-6090(00)01442-5

Cited by 59 publications

(36 citation statements)

References 16 publications

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“…This wall loss of atomic nitrogen is described by the surface loss probability β N which is a material specific property. Kersten et al 9 studied the energy flux with a thermal probe in the spacial afterglow of a N 2 plasma. They changed the substrate material of the thermal probe under comparable experimental plasma conditions so that the N influx was the same for all studied substrate materials.…”

Section: Introductionmentioning

confidence: 99%

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Wall loss of atomic nitrogen determined by ionization threshold mass spectrometry

Sode

Schwarz-Selinger

Jacob

et al. 2014

Journal of Applied Physics

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In the afterglow of an inductively coupled N 2 plasma relative N atom densities are measured by ionization threshold mass spectrometry (ITMS) as a function of time in order to determine the wall loss time t wN from the exponential decay curves. The procedure is performed with two mass spectrometers on different positions in the plasma chamber. t wN is determined for various pressures, i.e., for 3.0, 5.0, 7.5, and 10 Pa. For this conditions also the internal plasma parameters electron density n e and electron temperature T e are determined with the Langmuir probe and the rotational temperature T N 2 rot of N 2 is determined with the optical emission spectroscopy. For T N 2 rot a procedure is presented to evaluate the spectrum of the transition v' = 0 → v" = 2 of the second positive system (C 3 Π u → B 3 Π g ) of N 2 . With this method a gas temperature of 610 K is determined. For both mass spectrometers an increase of the wall loss times of atomic nitrogen with increasing pressure is observed. The wall loss time measured with the first mass spectrometer in the radial center of the cylindrical plasma vessel increases linearly from 0.31 ms for 3 Pa to 0.82 ms for 10 Pa. The wall loss time measured with the second mass spectrometer (further away from the discharge) is about 4 times higher. A model is applied to describe the measured t wN .The main loss mechanism of atomic nitrogen for the considered pressure is diffusion to the wall. The surface loss probability β N of atomic nitrogen on stainless steel was derived from t wN and is found to be 1 for the present conditions. The difference in wall loss times measured with the mass spectrometers on different positions in the plasma chamber is attributed to the different diffusion lengths.

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Section: Introductionmentioning

confidence: 99%

“…The first method is to measure the power influx onto a thermal probe in the spacial afterglow as mentioned above (see, e.g., Refs. [9][10][11] ). However, for this method the absolute density and temperature of atomic nitrogen n N has to be known.…”

Section: Introductionmentioning

confidence: 99%

Wall loss of atomic nitrogen determined by ionization threshold mass spectrometry

Sode

Schwarz-Selinger

Jacob

et al. 2014

Journal of Applied Physics

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“…[6] The energy flux of the plasma was examined by a self-designed thermoprobe. [7] The thermoprobe mainly consists of a circular metal plate, a Pt-PtRh thermocouple and a multimeter (Metrahit) with dedicated calculation software.…”

Section: Methodsmentioning

confidence: 99%

Reactive deposition of TiN_x layers in a DC‐magnetron discharge

Wrehde

Quaas

Bogdanowicz

et al. 2008

Surface & Interface Analysis

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TiN x layers have been deposited in 'balanced mode' and 'unbalanced mode' of a reactive DC-magnetron plasma (carrier gas argon, reactive gas nitrogen) under different conditions. Discharge power and reactive gas flow have been varied. The layers have been examined by X-ray photoelectron spectroscopy (XPS), X-ray reflectometry (XR), and spectroscopic ellipsometry (SE). The results of the layer analyses were combined with plasma investigations carried out by means of energy resolved mass spectrometry under the same conditions. By this method, it is possible to obtain a comprehensive view on the fundamentals of layer deposition, especially on the influence of the ions on the layer properties.Results show that the operation mode of the magnetron has a significant influence on the titanium deposition rate and the incorporation of nitrogen into the layers. The increased energy influx to the growing film in unbalanced mode results in a higher titanium deposition rate despite the lower number of sputtered particles. It also leads to an enhanced nitrogen insertion, since stoichiometric TiN could only be deposited in unbalanced mode.

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“…Active probes are also established, constructed as a planar substrate or as a rotationallysymmetric membrane, whereby the energy influx is determined by the measurement of a temperature gradient [3][4][5]. However, the temperature of these probes is not freely adjustable and its distribution along the surface is not constant.…”

Section: Introductionmentioning

confidence: 99%

Energy influx measurements with an active thermal probe in plasma-technological processes

Wiese¹,

Kersten²,

Wiese

et al. 2015

EPJ Tech Instrum

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Many plasma-technological applications are based on plasma wall interaction, which can be characterised by calorimetric probes to measure the energy influx from the plasma to the substrate surface. Passive probes are based on the principle of recording the temperature course during heating and cooling of the probe for calculating the energy influx. The disadvantages of these probes are that the energy influx has to be interrupted by switching off the energy source or by using suitable apertures and by the necessity of knowing the exact heat capacity of the probe. A continuously operating active probe is, therefore, developed which does not need to be calibrated and which compensates the environmental effects as well as the heat conduction by the probe holder. By means of controlled electrical heating the probe is set to a given working temperature and then the energy supply supporting the fixed operating temperature is measured. The energy influx by the plasma is compensated by decreasing the heating power and is directly displayed in J/cm 2 s. Some practical measurements are presented. Even, if the probe is designed as double probe the directionality of the energy influx can be determined.

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Investigations on the energy influx at plasma processes by means of a simple thermal probe

Cited by 59 publications

References 16 publications

Wall loss of atomic nitrogen determined by ionization threshold mass spectrometry

Wall loss of atomic nitrogen determined by ionization threshold mass spectrometry

Reactive deposition of TiN_x layers in a DC‐magnetron discharge

Energy influx measurements with an active thermal probe in plasma-technological processes

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Investigations on the energy influx at plasma processes by means of a simple thermal probe

Cited by 59 publications

References 16 publications

Wall loss of atomic nitrogen determined by ionization threshold mass spectrometry

Wall loss of atomic nitrogen determined by ionization threshold mass spectrometry

Reactive deposition of TiNx layers in a DC‐magnetron discharge

Energy influx measurements with an active thermal probe in plasma-technological processes

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Product

Resources

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Reactive deposition of TiN_x layers in a DC‐magnetron discharge