2004
DOI: 10.1016/j.tsf.2004.02.013
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Investigations on the effects of plasma-assisted pre-treatment for plasma-assisted chemical vapour deposition TiN coatings on tool steel

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Cited by 28 publications
(14 citation statements)
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“…This treatment provides not only greater surface hardness to the steel but also abrasion, fatigue and corrosion resistance are increased, combined with good toughness and plasticity 3 . The absence of oxides and contaminants is very important to the diffusion of nitrogen into the substrate [4][5][6] . With the nitriding treatment we produce different layers on the steel, the compound layer also called white layer, and the diffusion layer.…”
Section: Introductionmentioning
confidence: 99%
“…This treatment provides not only greater surface hardness to the steel but also abrasion, fatigue and corrosion resistance are increased, combined with good toughness and plasticity 3 . The absence of oxides and contaminants is very important to the diffusion of nitrogen into the substrate [4][5][6] . With the nitriding treatment we produce different layers on the steel, the compound layer also called white layer, and the diffusion layer.…”
Section: Introductionmentioning
confidence: 99%
“…The aim of this paper was improving adhesion of the TiN films. This was the study of Gammer et al [49]. Good adhesion was achieved when nitrogen-hydrogen atmosphere with 40%-80% nitrogen was used; the best adhesion quality values were achieved with 40% nitrogen.…”
Section: +*mentioning
confidence: 90%
“…Furthermore, this property needs to be measurable during application and application‐induced changes in structure and/or composition are required to result in a significant change in magnitude of the self‐reporting property. TiN was selected as a reference system since it is widely applied as protective coatings,6 diffusion barriers,7 or in microelectronics8 and has recently raised attention as plasmonic material 9. It shows a high thermal stability10 and metallic electrical properties,11 while its oxide TiO 2 exhibits a bandgap of ≈3.1 eV 12…”
Section: Introductionmentioning
confidence: 99%