Investigations on a nitriding process of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma

Jauberteau, Isabelle; Jauberteau, Jean-Louis; Goudeau, P.; Soulestin, Bernard; Marteau, M.; Cahoreau, M.; Aubreton, J.

doi:10.1016/j.surfcoat.2008.10.012

Cited by 19 publications

(26 citation statements)

References 23 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Jauberteau et al [34,[53][54][55] have prepared molybdenum nitride films from Mo films coated on Si (100) substrates in an expanding plasma reactor. The molybdenum coatings have been deposited by electron beam evaporation of a molybdenum target in pure Ar atmosphere at a pressure of 0.5 Pa on Si substrates heated at 673 K with a radiofrequency electrical discharge operating at 50 W. The deposition rates are typically equal to 0.02-0.25 nms…”

Section: β-Mo2n and γ-Mo2n Films In Expanding Plasmamentioning

confidence: 99%

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

et al. 2015

View full text Add to dashboard Cite

Among transition metal nitrides, molybdenum nitrides have been much less studied even though their mechanical properties as well as their electrical and catalytic properties make them very attractive for many applications. The δ-MoN phase of hexagonal structure is a potential candidate for an ultra-incompressible and hard material and can be compared with c-BN and diamond. The predicted superconducting temperature of the metastable MoN phase of NaCl-B1-type cubic structure is the highest of all refractory carbides and nitrides. The composition of molybdenum nitride films as well as the structures and properties depend on the parameters of the process used to deposit the films. They are also strongly correlated to the electronic structure and chemical bonding. An unusual mixture of metallic, covalent and ionic bonding is found in the stoichiometric compounds.

show abstract

Section: β-Mo2n and γ-Mo2n Films In Expanding Plasmamentioning

confidence: 99%

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

et al. 2015

View full text Add to dashboard Cite

show abstract

“…The roughness is equal Previous investigations performed on nitrided molybdenum films heated at 873 K and exposed to ternary plasma have shown that a large nitrogen diffusion occurs in molybdenum films with diffusion coefficients ranging between 5 x 10 -10 and 5 x 10 -9 cm 2 s -1 . The formation of grains of nanometer size of Mo 2 N tetragonal structure is also reported [5]. This structure has not been detected in molybdenum films heated at 673 K. Investigations are currently carried out to evidence a possible formation of nonstoichiometric Mo-N phases.…”

Section: Resultsmentioning

confidence: 80%

“…At a depth larger than 40 nm, the oxygen concentration is similar to the one corresponding to the untreated substrate. It is worth noting that the sputtering effect of impinging energetic ions which plays a great role in most of plasma treatments is rather low in our process, since the mean electron energy values range between 0.5 and 0.7 eV in (Ar-N 2 -H 2 ) gas mixtures, so the reduction of oxide layers is mainly due to the reducing properties of hydrogen species [5]. Moreover, the addition of hydrogen in the nitriding gas mixture prevents the molybdenum film from oxidizing during the nitriding process.…”

Section: Resultsmentioning

confidence: 99%

“…The experiments are all carried out at a total pressure of 0.13 kPa using an Alcatel roots blower pump. More details are given in reference [5]. The surface temperature is calibrated with a two colours pyrometer (IRCON mirage).…”

Section: Experimental Set-upmentioning

confidence: 99%

“…Moreover, since metal nitrides exhibit a good corrosion resistance, a very thin layer forms a good diffusion barrier preventing the metal film from oxidizing [3]. A thermochemical process including expanding plasma activated by microwave discharge has been successfully developed for metal nitriding [4,5]. The method consists of producing gaseous species and carrying them out along the discharge up to the workpiece surface.…”

mentioning

confidence: 99%

See 2 more Smart Citations

A nitriding process of very thin molybdenum films in an expanding microwave plasma at low temperature

Touimi¹,

Jauberteau²,

Weber³

et al. 2010

IOP Conf. Ser.: Mater. Sci. Eng.

View full text Add to dashboard Cite

A nitriding process of very thin molybdenum films in an expanding microwave plasma at low temperature Abstract. A transfer of nitrogen of about 20 at % is detected in very thin molybdenum films of about 200 nm thick coated on Si (100) wafers heated at 673 K and exposed to ternary (Ar-N 2 -H 2 ) plasma. The nitrogen diffusion goes with a noticeable decrease of the remaining oxide layers in the whole film thickness. On the contrary, pure N 2 gas exposure leads to a slight diffusion of nitrogen into the first molybdenum layers up to a depth of about 40 nm, only and an enhancement of oxygen amount also. Hydrogen species contained in the plasma reduce the oxide layers which act as nitrogen diffusion barrier. The nitrogen diffusion decrease with increasing distance of the workpiece surface from the centre of the discharge as well as the occurrence of nitrogen diffusion in molybdenum layers at room temperature highlight the role of NH x<3 active species of the plasma on the reactivity of the surface. The morphology of the nitrided surface consists of slightly smaller grains compared with those corresponding to untreated molybdenum films ranging in size from 30 to 50 nm wide. In contrast to substrates heated at 873 K, the tetragonal Mo 2 N structure has not been detected in molybdenum films heated at 673 K. IntroductionIn addition to attractive physical and chemical properties of transition metal nitrides such as high hardness, melting point and electrical conductivity, good chemical stability, a growing scientific and technological interest is focused on their catalytic properties. Mo 2 N and W 2 N compounds are catalytically active for NO reduction in presence of hydrogen. The NO conversion on Mo 2 N is equal to 89 % at 723 K and remains constant for 10 h. Besides, the catalytic properties of Mo 2 N can be compared to those of noble metals for hydroprocessing, H 2 -D 2 exchange reactions and so on… [1][2]. Moreover, since metal nitrides exhibit a good corrosion resistance, a very thin layer forms a good diffusion barrier preventing the metal film from oxidizing [3]. A thermochemical process including expanding plasma activated by microwave discharge has been successfully developed for metal nitriding [4,5]. The method consists of producing gaseous species and carrying them out along the discharge up to the workpiece surface. Since the density of electrons in the discharge is strongly reduced by inelastic collisions occurring between electrons and molecules, high dilutions of molecular gas in Ar gas are realized. So, this method allows selecting active gaseous species such as NH x<3 simple radicals since, they are mainly detected in (Ar-N 2 ) gas mixtures with low N 2 as H 2 is injected within the discharge [6]. The purpose of this work is to carry out measurements on the transfer of nitrogen into very thin molybdenum layers heated at low temperature and exposed to various (Ar-N 2 -

show abstract

Epitaxial Growth of Ultrathin δ-Like ΜοΝ Films on Ru(0001)

Khaniya

Kaden

2019

Top Catal

View full text Add to dashboard Cite

Investigations on a nitriding process of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma

Cited by 19 publications

References 23 publications

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

A nitriding process of very thin molybdenum films in an expanding microwave plasma at low temperature

Epitaxial Growth of Ultrathin δ-Like ΜοΝ Films on Ru(0001)

Contact Info

Product

Resources

About