Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering

“…This makes it an optimum material to be included in mixed thin films used, for example, for tribological applications (protective coatings), optical applications (solar absorber materials), microelectronic applications, etc. [37][38][39][40]. Apart from this, both planar electronics processing and the modern integrated-circuit industry have been made possible by the unique properties of silicon oxide (SiO 2 ), the only native oxide of a common semiconductor which is stable in water and at elevated temperatures, an excellent electrical insulator, a mask to common diffusing species, and capable of forming a nearly perfect electrical interface with its substrate [41,42].…”