Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering

In-depth multi-technique characterization of chromium–silicon mixed oxides produced by reactive ion beam mixing of the Cr/Si interface

“…In the light of these results, it is clear that either higher implantation doses or a post-implantation annealing treatment would be required to obtain more stoichiometric and homogeneous oxide films as the ones prepared with reactive magnetron sputtering. 13,14 Finally, we have compared the results obtained for the different depth profiling analyses with the observations made by TEM on the sample implanted at 1 Â 10 18 ions cm À2 . The inset of Fig.…”

“…Moreover, a Instituto Ciencia Materiales de Madrid, ICMM-CSIC, 28049 Madrid, Spain. E-mail: rescobar@icmm.csic.es; Fax: +34 91 372 0623; Tel: +34 91 334 9000 b Departamento de F ısica Aplicada, Universidad Aut onoma de Madrid, 28049 Madrid, Spain Vergara et al 13 and Benito et al 14 have recently shown the viability of reactive magnetron sputtering to the control of the optical properties of silicon and chromium mixed oxides. A second alternative synthesis is ion beam mixing (IBM), where compounds are formed by bilayer mixing using ion beams.…”

An XPS and ellipsometry study of Cr–O–Al mixed oxides grown by reactive magnetron sputtering

“…In a first approach, the optical and electrical properties of the mixed oxides are expected to vary between those corresponding to Cr 2 O 3 and Al 2 O 3 as has been shown for Cr-O-Si [13] and Zr-O-Si [22] mixed oxides. With this in mind, the refractive index could be varied, for instance, by controlling the composition of the mixed oxide as shown above.…”

“…[11,12]. In a recent publication, we have presented experimental results on the growth of thin film Cr-O-Si mixed oxides by reactive magnetron sputtering to be used as optical coatings in which we have been able to vary the refractive index of the mixed oxides in a controlled way between those of each of their constituent single oxides [13]. Therefore, as a continuation of this previous publication, the purpose of this work is to explore the synthesis of Cr-O-Al mixed oxides by reactive magnetron sputtering using X-ray photoelectron spectroscopy (XPS) and angle resolved X-ray photoelectron spectroscopy (ARXPS) as analytical tools.…”

ZnxZryOz thin films grown by DC magnetron sputtering

“…The possibility of growing thin films with different chemical compositions and crystalline structures from those of the traditional metallic oxides allows the design of materials with predetermined properties. In previous works , we investigated the modification of optical properties, particularly the refractive index, by varying the chemical composition and crystalline structure of Cr:O:Al and Cr:O:Si ternary compounds in thin film geometries. ZrO 2 is a dielectric material with a refractive index of 2.1 and a band gap over 5 eV; in addition, ZrO 2 has very good thermal, chemical, and mechanical stability, which makes it very suitable for microelectronics and other device applications .…”