2003
DOI: 10.1016/s0257-8972(03)00583-8
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Investigation of the RF plasma jet system for deposition of LiCoOx thin films

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Cited by 12 publications
(6 citation statements)
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“…Several techniques have been adopted by researchers around the world such as electrophoretic deposition 4,70 , electrospinning, plasma processing [71][72][73][74] and sputtering 75-77 .…”
Section: Binder Free Electrodes For Improved Characteristicsmentioning
confidence: 99%
“…Several techniques have been adopted by researchers around the world such as electrophoretic deposition 4,70 , electrospinning, plasma processing [71][72][73][74] and sputtering 75-77 .…”
Section: Binder Free Electrodes For Improved Characteristicsmentioning
confidence: 99%
“…Its most characteristic and significant property is the formation of a well defined plasma channel what makes the plasma jet sputtering system especially convenient for the deposition on substrates with complicated shapes, e.g. To the long series of materials which has been successfully prepared by means of the plasma jet sputtering system TiO 2 [3], TiN [4], AlN [5], CrN [6], Cu 3 N [7], Al 2 O 3 [5], LiCoO x [8], ZnO [9] or SrTiO 3 (STO) and Ba x Sr 1−x TiO 3 (BSTO) ceramics [10] belong. [2].…”
Section: Introductionmentioning
confidence: 99%
“…TiN [7], AlN [8], CrN [9], Cu 3 N [10], TiO x [11], Al 2 O 3 [6], CN x [12], diamondlike-carbon (DLC) layers [13] and LiCoO x [14]. In these applications, usually a metallic or single component hollow cathode was reactively sputtered in a suitable working gas.…”
Section: Introductionmentioning
confidence: 99%