“…and electrodes in order to protect them from the penetration of atmospheric oxygen (O 2 ) and water vapour (H 2 O) molecules into the device that induces degradation and corrosion. Inorganic films such as silicon oxide (SiO x ) and aluminium oxide (AlO x ) which are optically transparent are used as barrier materials [2,6,[10][11][12][13]. The barrier properties, and the quality of these inorganic films depend on many factors, such as the process parameters, the deposition rate and the initial stages of the deposition and the stiffness and smoothness of the substrate [4,5,14].…”