2020
DOI: 10.1109/tnano.2020.3033802
|View full text |Cite
|
Sign up to set email alerts
|

Investigation of Temperature and Source/Drain Overlap Impact on Negative Capacitance Silicon Nanotube FET (NC Si NTFET) with Sub-60mV/decade Switching

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(1 citation statement)
references
References 22 publications
0
1
0
Order By: Relevance
“…Another architecture called Nanotube, 6,[14][15][16][17] which has a similar structure as that of a nanowire but has an additional gate called "Core gate" at the center of the device, 16 exhibited better performance than NWMOSFETs by offering a better gate control over the channel. Therefore, to overcome the need for ultra-steep doping levels and complex temperature budgets, the structure of Nanotube JLFETs (NT-JLFETs) was proposed.…”
mentioning
confidence: 99%
“…Another architecture called Nanotube, 6,[14][15][16][17] which has a similar structure as that of a nanowire but has an additional gate called "Core gate" at the center of the device, 16 exhibited better performance than NWMOSFETs by offering a better gate control over the channel. Therefore, to overcome the need for ultra-steep doping levels and complex temperature budgets, the structure of Nanotube JLFETs (NT-JLFETs) was proposed.…”
mentioning
confidence: 99%