A nanotube architecture of functionless field effect transistor (JLFET) is investigated wherein it is observed that the performance characteristics of JLFET are improved by introducing dielectric pockets into the device near the source-channel and channel-drain interfaces by coming up with a novel structure of nanotube junctionless FET (NTJLFET) called as dielectric pocket-NTJLFET (DP-NTJLFET). Using TCAD tool, the proposed DP-NTJLFET has been simulated for a channel length of 20 nm in order to consider and show the improvement in various short-channel effects. The inclusion of dielectric pockets into the device significantly reduced the OFF-state current, which eventually improved the current switching ratio (~2600%) for a pocket length and thickness of 4 and 7nm, respectively. Further, the proposed device exhibits an improved subthreshold swing characteristics and a better measure of DIBL (improved by ~ 12%) for DP-NTJLFET as compared to the conventional NTJLFET. As a result of achieving low OFF-state current, the proposed DP-NTJLFET may be found suitable for the future low-power applications.