Investigation of solar cell performance using multilayer thin film structure (SiO2/Si3N4) and grating

Dubey, R.S.; Jhansirani, K.; Singh, Shyam

doi:10.1016/j.rinp.2016.11.065

Cited by 13 publications

(4 citation statements)

References 13 publications

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“…The multiple layers consist of silicon dioxide and silicon nitride shows an increase in the light absorption which enhances the efficiency of the solar cell. This inclusion of another layer does not affect the industrial fabrication process rather act as a simplified step 33) .…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Oxide Passivated and Antireflective Thin Film Coated Emitter Layer in Two Steps for the Application in Photovoltaic

Akter¹,

Hossion²,

Amin³

2022

Evergreen

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The gap between laboratory scale and commercial silicon solar cells is wider, as many processes are not being practiced in commercialization. In this work, we have investigated the silicon solar cell fabrication process followed by industries and proposed a simplified process. The fabrication process for the emitter layer, 100 nm thin film anti-reflection coating and wet oxide passivation in a single chamber diffusion furnace on 200 micron p-type mono crystalline silicon wafer was followed. The diffusion process was carried out in an atmospheric furnace using phosphorus oxychloride as dopant source, oxygen for anti-reflection coating and wet oxide surface passivation. Topographical, optical and electrical characterization were conducted to understand the properties of the above layers for application in solar cell fabrication. The reflectivity and average sheet resistivity data of the diffused wafer is in the range those published in literature. Following the procedure, number of process steps, instrument and cost of commercial solar cell fabrication can be optimized.

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Section: Introductionmentioning

confidence: 99%

Fabrication of Oxide Passivated and Antireflective Thin Film Coated Emitter Layer in Two Steps for the Application in Photovoltaic

Akter¹,

Hossion²,

Amin³

2022

Evergreen

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“…Silicon nitride (SiN x ) films have been widely used in optical coatings as a high refractive index material [1]. Silicon nitride thin films can be used as antireflection coatings and passivation layers because they possess several attractive features [2], for example, high hardness, corrosion resistance, temperature resistance, thermal conductivity and insulation.…”

Section: Introductionmentioning

confidence: 99%

Surface roughness and residual stress evolution in SiNx/ SiO2 multilayer coatings deposited by reactive pulsed magnetron sputtering

Tien¹,

Lee²,

Lin³

et al. 2021

Optica Applicata

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The surface roughness and residual stress behavior in two types of SiNx/SiO2 dielectric quarter-wave stacks was investigated experimentally. A reactive pulsed magnetron sputtering system was used to prepare the SiNx/SiO2 multilayer thin films. The results show that SiNx/SiO2 quarter-wave stack with a buffer layer of MgF2 thin film can reduce the residual stress. The effect of aging on the residual stress in two quarter-wave stacks was also studied. We found that the residual stresses in both SiNx/SiO2 multilayer coatings are changed from a compressive state to a tensile stress state with increasing the aging time. The root mean square (RMS) surface roughness of MgF2/(SiNx/SiO2)22 and (SiNx/SiO2)22 quarter-wave stacks are 2.23 ± 0.22 nm and 2.08 ± 0.20 nm, respectively.

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“…[23,24] Many researches have focused on the improving efficiency of Si solar cells encapsulated by antireflective coating (AR) with complex micro/nanostructure surface. [25][26][27][28][29] It is well known that dust accumulation is one of the natural phenomena, which adversely affects the performance of solar cell devices. [30] Therefore, the surface of solar cell device has to be cleaned termly to maintain the solar cell performance undegraded.…”

Section: Introductionmentioning

confidence: 99%

“…Micro/nanostructures are fragile and vulnerable in cleaning the dust particles, which might lead to the serious degradation of the micro/nanostructures AR performance and lower the output power of solar cell device. On the other hand, the fabrication process of the micro/nanostructure AR coatings is complex and the cost of fabrication is high, [25][26][27][28][29]31] which is incompatible with industrial mass production of solar cells.…”

Section: Introductionmentioning

confidence: 99%

Application of millimeter-sized polymer cylindrical lens array concentrators in solar cells

Zhang

Lin

et al. 2018

Chinese Phys. B

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A unique method is proposed to encapsulate solar cells and improve their power conversion efficiency by using a millimeter-sized cylindrical lens array concentrator. Millimeter-sized epoxy resin polymer (ERP) cylindrical lens array concentrators are fabricated by the soft imprint technique based on polydimethylsiloxane stamps. The photovoltaic measurements show that millimeter-sized ERP cylindrical lens array concentrators can considerably improve the power conversion efficiency of silicon solar cells. The validity of the proposed method is proved by the coupled optical and electrical simulations. The designed solar cell devices with the advantages of high-efficiency and convenient cleaning are very useful in practical applications.

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Investigation of solar cell performance using multilayer thin film structure (SiO2/Si3N4) and grating

Cited by 13 publications

References 13 publications

Fabrication of Oxide Passivated and Antireflective Thin Film Coated Emitter Layer in Two Steps for the Application in Photovoltaic

Fabrication of Oxide Passivated and Antireflective Thin Film Coated Emitter Layer in Two Steps for the Application in Photovoltaic

Surface roughness and residual stress evolution in SiNx/ SiO2 multilayer coatings deposited by reactive pulsed magnetron sputtering

Application of millimeter-sized polymer cylindrical lens array concentrators in solar cells

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